Process for reacting dissociated zircon with gaseous hydrogen fluoride
AssigneeAtomic Energy Corporation of South Africa Limited
InventorJonathan Nel
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Abstract
A process for treating dissociated zircon comprises reacting dissociated zircon with gaseous hydrogen fluoride at an elevated reaction temperature. The reaction temperature is controlled to obtain at least one desired zirconium-based compound and at least one desired silicon-based compound.
Claims24
A process for reacting dissociated zircon with hydrogen fluoride, wherein the hydrogen fluoride is in gaseous form and the reaction is effected at a reaction temperature between 50.degree. C. and 550.degree. C., with the reaction temperature being controlled to obtain at least one zirconium-based compound selected from the group consisting of zirconium tetrafluoride, a zirconium oxide and a zirconium oxyfluoride and at least one silicon-based compound.
Dependencies are inferred from the claim text.