Surface processing method effected for total-reflection X-ray fluorescence analysis
AssigneeKabushiki Kaisha Toshiba
InventorKunihiro Miyazaki
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Abstract
A surface processing method effected before the total-reflection X-ray fluorescence analysis is effected is disclosed. The surface processing is to modify all of the contaminants attached at least to the measurement surface of the wafer into particle-shaped residues. For this purpose, the measurement surface of the wafer is first dissolved by hydrofluoric acid to form a large number of droplets on the measurement surface. Next, the thus formed droplets are dried with the position thereof kept unchanged. After the drying, contaminants attached to the measurement surface of the wafer are left as particle-shaped residues. After this, the measurement surface of the wafer is analyzed by the total-reflection X-ray fluorescence analyzing method.
Claims22
A surface processing method for a subject which is subjected to the total-reflection X-ray fluorescence analysis, comprising the steps of:
- preparing a subject;
- dissolving at least contaminant lying on the measurement surface of the subject and entrapping the contaminant into a multitude of droplets without changing the in-plane distribution of the contaminant;
- and
- drying said multitude of droplets in place to obtain particle-shaped residues of the contaminant.
Dependencies are inferred from the claim text.