US 5,686,224 AGranted

Ink jet print head having channel structures integrally formed therein

AssigneeXerox Corporation

InventorJames F. O'Neill

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Abstract

A plurality of a thermal ink jet printheads are fabricated from a heater wafer, on which a plurality of arrays of heaters, transducers and addressing logic are located on one surface thereof, by depositing multiple coatings of a positive photoresist over the heater wafer to achieve a desired thickness and then exposing to the photoresist UV (ultra violet) light through a graded mask. The mask controls the depth of developed resist and concurrently forms a variable depth profile for the ink channel structures containing ink flow channels, reservoirs, and heater pits in a single step. A flat glass substrate with ink inlets formed therein is mated to the patterned photoresist to complete the wafer/substrate pair containing the plurality of printheads. The individual printheads are obtained by a subsequent dicing operation. In an alternate embodiment, a negative acting positive photoresist is used.

A method of fabricating a thermal ink jet printhead, comprising the steps of:

(a) providing a silicon wafer having on one surface thereof a plurality of arrays of heating elements, drivers, and logic circuitry for selectively addressing the heating elements with electrical pulses;
(b) applying a first layer of negative-acting photoresist on the surface of the silicon wafer containing the heating elements, drivers, and logic circuitry;
(c) exposing said first photoresist layer to UV light through a non-graded mask having opaque areas and clear areas thereby causing exposed portions of the layer to be soluble in developer;
(d) heating the first photoresist layer until said exposed portions are insoluble in developer;
(e) blanket exposing the first photoresist layer to UV light causing previously unexposed portions to become soluble in developer;
(f) developing said first photoresist layer to remove all soluble photoresist forming heater pits in said wafer;
(g) applying a second layer of negative-acting photoresist on said developed first layer;
(h) exposing said second photoresist layer to UV light through a graded mask having opaque, clear and variable areas thereby creating a latent image at the layer surface;
(i) heating the layer until the portions under the clear and variable areas are partially insoluble, respectively, in developer;
(j) blanket exposing the second photoresist layer to UV light causing previously unexposed areas to become soluble in developer;
(k) developing said second photoresist layer to remove all soluble photoresist thereby forming channel recesses of various depths,
(l) bonding a flat substrate having a plurality of through holes therein to the developed photoresist layer on the silicon wafer, said bonding step encapsulating said channel recess structures formed integrally on said silicon wafer and forming the thermal ink jet printheads;
and
(m) dicing the developed photoresist layer and flat substrate into a plurality of individual printheads.

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Abstract

Claims1