Resist treating method
AssigneesTokyo Electron Limited, Tokyo Electron Kyushu Limited
InventorsHiroyuki Matsukawa, Akira Yonemizu, Michiaki Matsushita, Akihiro Fujimoto, Takashi Takekuma, Hidetami Yaegashi, Takahide Fukuda
Life of this patent
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Abstract
There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged along a convey path on which the convey mechanism conveys the object, for cleaning the object, and an object reversing mechanism, arranged along the convey path, for reversing the object.
Claims6
A resist treating method comprising the steps of:
- unloading an object to be processed from a carrier in which the object having two major surfaces is stored, conveying the object to a resist coating mechanism, and applying a resist coating treatment to one major surface of the object within said resist coating mechanism;
- reversing the object after the resist coating treatment outside said resist coating mechanism;
- conveying the reversed object to a cleaning mechanism, and applying a cleaning treatment to the other major surface of the object within said cleaning mechanism;
- reversing the object after said cleaning treatment outside said cleaning mechanism;
- conveying the reversed object to an exposure apparatus, and applying an exposure treatment to the coating film within said exposure apparatus;
- and
- conveying the object after the exposure treatment to a developing apparatus for applying a developing treatment to the coating film.
Dependencies are inferred from the claim text.