US 5,685,949 A · Plasma treatment apparatus and method

Abstract

A plasma treatment apparatus for plasma treating an object to be treated or workpiece by exposure to ions, free radicals and activated gas species generated by a plasma discharge includes a suscepter electrode supposing the workpiece and another electrode facing the suscepter electrode, together constituting a pair of plasma generating electrodes across which an AC voltage is applied. The apparatus also includes halogen lamps which are disposed outside of the respective electrodes for radiating heat rays to the object. The plasma generating electrodes are formed of a material which transmits the heat rays from the halogen lamp and resists a temperature of about 200.degree. C. or higher, such as a doped silicon in which impurities are doped into a silicon substrate. Thus, the object may be treated in a short time and at a low temperature by heating and using a plasma.

Claims25

Dependent claims

A plasma treatment apparatus for treating a workpiece with ions, free radicals and activated gas species which are generated by a plasma discharge, comprising:

a pair of spaced plasma generating electrodes across with an AC voltage is applied, said plasma generating electrodes including a suscepter electrode supporting said workpiece and an opposite electrode opposite said suscepter electrode;
and
a heat source for radiating heat rays to said workpiece;
and wherein
at least one electrode of said pair of plasma generating electrodes faces said heat source and is formed of a material which transmits said heat rays and has a heat resistance to a temperature of about 200.degree. C. or higher.

2 more elements

Dependencies are inferred from the claim text.

Plasma treatment apparatus and method

Life of this patent

Plasma treatment apparatus and method

Life of this patent

Abstract

Claims25