Vacuum processing system
AssigneeHitachi, Ltd.
InventorsShigekazu Kato, Naoyuki Tamura, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou, Kenji Nakata, Yoshifumi Ogawa
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AssigneeHitachi, Ltd.
InventorsShigekazu Kato, Naoyuki Tamura, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou, Kenji Nakata, Yoshifumi Ogawa
Estimating the term…
A vacuum treating apparatus having a vacuum treating chamber for treating a to-be-treated substrate in vacuum, includes a plurality of substrate cassettes which are installed in the open air and hold substrates that are to be conveyed into the vacuum treating chamber, a device for conveying the substrates between the substrate cassettes and the vacuum treating chamber, and a device which selects either that the to-be-treated substrate after treated in the vacuum treating chamber be held in the substrate cassette from which the to-be-treated substrate was taken out or that the to-be-treated substrate after treated in the vacuum treating chamber be held in another substrate cassette which is different from the substrate cassette.
A vacuum treating apparatus comprising:
Dependencies are inferred from the claim text.