Self-assembly fabrication method for planar micro-motor

A method of fabricating a planar micro-motor comprising:

• a stator supported by an electrically insulating substrate comprising micro-coils arrayed in a first plane and circumferentially spaced about a center point, for receiving electrical current to selectively generate electromagnetic fields;
• a rotor comprising a planar rotor body having a plurality of magnetic regions circumferentially spaced about a rotor shaft and aligned over the micro-coils in a second plane parallel with the first plane;
• and
• a housing comprising side and cover walls integral with the substrate to form a rotor chamber, the rotor body being captured in the rotor body between the stator below and the cover wall of the housing above, and being rotatable in the rotor chamber in response to electromagnetic fields generated across a planar gap between the rotor body and the micro-coils;
• the fabrication method comprising in combination, the following steps in the order recited:
• microfabricating the stator on an electrically conductive upper surface of the insulating substrate;
• forming a planar lower release layer over at least the micro-coils of the stator;
• microfabricating the rotor body above the stator, thereby sandwiching the lower release layer between them, the side wall of the housing, a perimeter release channel radially outward of the rotor body as an upward extension of the lower release layer, and a planar upper release layer over the rotor body as an extension of the perimeter release channel;
• forming the cover wall of the housing over the upper release layer, thereby sandwiching the upper release layer between the cover wall and the rotor body;
• and
• forming the rotor chamber by removing the upper release layer, the peripheral release channel, and the lower release layer to free the rotor body for rotation.

A batch method of microfabricating from a single wafer of smooth, electrically insulating substrate material a plurality of planar stepper micro-motors, each stepper micro-motor comprising:

• a substrate formed of a portion of the wafer;
• stator means for receiving three-phase electrical power to selectively generate electromagnetic fields, comprising (a) circumferentially spaced bifilar micro-coils supported by the substrate and arrayed radially in a first plane about a center point and (b) stator teeth arrayed in a circle in said first plane radially outward of the bifilar micro-coils;
• rotor means for rotation in a second plane substantially parallel to the first plane in response to said electromagnetic fields, comprising circumferentially spaced, elongate magnetic pole members arrayed radially in a planar rotor body about a rotor shaft having a longitudinal axis of rotation substantially normal to the rotor body and passing through said center point in the first plane, and rotor detente teeth arrayed in the rotor body in a circle in said second plane radially outward of the pole members in registry with the stator teeth;
• housing means comprising a sidewall supported on the stator means and surrounding the rotor body and a cover wall integral therewith extending over the rotor body in a third plane substantially parallel with the first and second planes, the housing and stator means together forming a rotor chamber in which the rotor body is rotatably captured;
• and
• energizing means for selectively passing electrical power to the bifilar micro-coils to generate electromagnetic fields, comprising concentric power buses substantially in the plane of the bifilar micro-coils, at least one of the buses corresponding to each of the three current phases, and each of the power buses comprising arcuate segments extending from one bifilar micro-coil to the next micro-coil of the same current phase;
• the microfabrication method comprising depositing a first electroplating strike on an upper surface of the wafer and then, substantially simultaneously for each micro-motor being formed on the wafer, performing in combination, in the following order, the steps of:
• depositing and patterning a first layer of photo-responsive patterning material for forming electrical jumpers extending radially between the bifilar micro-coils and corresponding ones of the power buses;
• electroplating the electrical jumpers into the first layer of photo-responsive patterning material;
• depositing and patterning a second layer of photo-responsive patterning material for forming electrically conductive lower vias extending upwardly from the jumpers;
• electroplating the lower vias into the second layer of photo-responsive patterning material;
• removing the first and second layers of photo-responsive patterning material and exposed areas of the first electroplating strike;
• depositing a first epoxy layer on the upper surface of the substrate in sufficient depth to cover the vias, and then micromilling to planarize its upper surface and expose the vias;
• depositing a second electroplating strike on the upper surface of the first epoxy layer in electrical contact with the exposed vias;
• depositing and patterning a third layer of photo-responsive patterning material on the second electroplating strike for forming the bifilar micro-coils and power buses in registry with the vias;
• removing the third layer of photo-responsive patterning material;
• depositing and patterning a fourth layer of photo-responsive patterning material in sufficient depth to cover the micro-coils and power buses, for forming the stator teeth;
• electroplating the stator teeth of magnetic material into the fourth layer of photo-responsive patterning material;
• removing the fourth layer of photo-responsive patterning material and exposed areas of the second electroplating strike;
• forming a stator sub-assembly by depositing a second epoxy layer and then micromilling to planarize its upper surface and expose the bifilar micro-coils, stator teeth, and power buses;
• depositing a first release layer over a center portion of the upper surface of the stator sub-assembly corresponding to the lower surface of the rotor chamber, covering at least the bifilar micro-coils and stator teeth;
• depositing a third electroplating strike over the release layer and exposed upper surface of the stator sub-assembly, in electrical contact with the power buses;
• depositing and patterning a fifth layer of photo-responsive patterning material on the third electroplating strike for forming the rotor pole members and rotor detente teeth in registry with the bifilar micro-coils and stator teeth, respectively;
• removing the fifth layer of photo-responsive patterning material;
• depositing a sixth layer of photo-responsive patterning material to a depth sufficient to cover the rotor pole members and rotor detente teeth, and patterning the sixth layer of photo-responsive patterning material for forming lower portions of the rotor shaft and electrically conductive upper vias for the power buses;
• electroplating into the sixth layer of photo-responsive patterning material the lower portions of the rotor shaft and upper vias;
• removing the sixth layer of photo-responsive patterning material and exposed areas of the third electroplating strike;
• depositing a seventh layer of photo-responsive patterning material for forming a vertical first release channel extending upwardly from the first release layer at its outer perimeter, corresponding to a circumferential outer surface of the rotor chamber;
• depositing release material into the first release channel and micromilling the seventh layer of photo-responsive patterning material to planarize its upper surface and expose upper surfaces of the lower portions of the rotor shaft and upper vias, a portion of the seventh layer of photo-responsive patterning material remaining in the plane of the rotor pole members both radially inward and radially outward of the release channel;
• depositing and patterning an eighth layer of photo-responsive patterning material for upwardly extending the first release channel and upper portions of the rotor shaft and upper vias;
• depositing by electroless plating into the eighth layer of photo-responsive patterning material to upwardly extend the upper portions of the rotor shaft and upper vias, and depositing release material (a) into the upward extension of the first release channel and (b) in a second release layer covering the upper surface of the eighth layer of photo-responsive patterning material between the first release channel and the rotor shaft, such second release layer corresponding to the upper surface of the rotor chamber;
• depositing and patterning a ninth layer of photo-responsive patterning material consisting of positive photoresist material upwardly extending the upper portions of the rotor shaft and upper vias;
• extending the upper portions of the rotor shaft and upper vias by electroless plating into the ninth layer of photo-responsive patterning material;
• further patterning the ninth layer of photo-responsive patterning material for forming a second vertical release channel surrounding the extended upper portion of the rotor shaft, and depositing release material into the ninth layer of photo-responsive patterning material to form the second release channel;
• depositing and patterning a temporary protective film over the ninth layer of photo-responsive patterning material to prevent its exposure to actinic radiation;
• depositing and patterning a tenth layer of photo-responsive patterning material for upwardly extending the upper portion of the rotor shaft;
• upwardly extending the upper portion of the rotor shaft by electroless plating;
• removing at least portions of the eight, ninth and tenth layer of photo-responsive patterning material and the protective film, a portion of the eighth layer of photo-responsive patterning material remaining as part of the rotor body, and at least portions of the eighth and ninth layers of photo-responsive patterning material remaining in the plane of the rotor body and above it, respectively, as a portion of the micro-motor housing;
• and
• releasing the rotor for rotation within the rotor chamber in response to electromagnetic fields generated by the bifilar micro-coils by removing the release material from the first and second release layers and the first and second release channels.