Method for manufacturing a thin film actuated mirror array

A method for manufacturing an array of M.times.N thin film actuated mirrors, wherein M and N are integers, for use in an optical projection system, the method comprising the steps of:

• providing an active matrix including a substrate, an array of M.times.N connecting terminals and an array of M.times.N transistors, wherein each of the connecting terminals is electrically connected to a corresponding transistor in the array of transistors;
• depositing a thin film sacrificial layer on top of the active matrix;
• ion-implanting the thin film sacrificial layer, thereby degrading a structural integrity thereof;
• creating an array of M.times.N pairs of empty cavities in the thin film sacrificial layer, one of the empty cavities in each pair being encompassing one of the connecting terminals;
• depositing an elastic layer, made of an insulating material, on top of the thin film sacrificial layer including the empty cavities;
• forming an array of M.times.N conduits, each of the conduits extending from top of the elastic layer to top of a corresponding connecting terminal;
• depositing a second thin film, a thin film electrodisplacive and a first thin film layers on top of the elastic layer, thereby forming a multiple layered structure including the first thin film, the thin film electrodisplacive, the second thin film and the elastic layers, wherein the second thin film layer is made of an electrically conducting material, and the first thin film layer is made of an electrically conducting and light reflecting material;
• patterning the multiple layered structure into an array of M.times.N semifinished actuated mirrors, wherein each of the semifinished actuated mirrors has a top surface and side surfaces, and includes a first thin film electrode, a thin film electrodisplacive member, a second thin film electrode and an elastic member;
• forming a thin film protection layer completely covering the top surface and the side surfaces of each of the semifinished actuated mirrors;
• removing the thin film sacrificial layer by using an etchant;
• rinsing the etchant away by using a rinse;
• removing the rinse;
• and
• removing the thin film protection layer, thereby forming the array of M.times.N thin film actuated mirrors.