Plating cell and plating method with fluid wiper
AssigneeReynolds Tech Fabricators, Inc.
InventorH. Vincent Reynolds
Life of this patent
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AssigneeReynolds Tech Fabricators, Inc.
InventorH. Vincent Reynolds
Estimating the term…
A plating cell for plating a flat substrate, for example, a stamper for a high-density compact disk recording, employs a sparger to introduce a flow of electrolyte across the surface of the substrate to be plated. A fluid-powered rotary blade or wiper within the cathode chamber has a rotary blade with an edge spaced a small distance, preferably about three-eighths inch, from the substrate, and an annular turbine which rotates under a flow of the electrolytic fluid that is also being fed to the sparger. The rotary wiper is run at a speed between about 35 and 80 rpm and draws the electrolyte away from the substrate. This helps remove hydrogen bubble that form during electroplating. A semipermeable weir separates the cathode chamber from an anode chamber that contains an anode basket that is filled with plating material. The plating cell is provided with a backwash flow regime so that impurities and inclusions from the anode chamber are kept out of the plating bath.
An electroplating cell for plating a planar face of a substrate with a metal layer, comprising a plating bath that contains an electrolyte in which said substrate is immersed in a cathode chamber of the bath, sparger means for introducing the electrolyte into the bath, an anode chamber in which an anode is disposed and which contains a quantity of metal that is consumed during plating, a weir which separates said anode chamber from said cathode chamber and permits the electrolyte to spill over from the cathode chamber into the anode chamber, said weir including means for permitting metal ions to pass through from the anode chamber into said cathode chamber, drain outlet means for carrying electrolyte and any entrained particulate matter from the anode chamber;
An electroplating cell for plating a planar face of a substrate with a metal layer, comprising a plating bath containing an electrolyte in which said substrate is immersed in a cathode chamber of the bath, sparger means for introducing the electrolyte into the bath, an anode chamber in which an anode is disposed and which contains a quantity of metal that is consumed during plating, a weir which separates said anode chamber from said cathode chamber and permits the electrolyte to spill over from the cathode chamber into the anode chamber, said weir including means for permitting metal ions to pass through from the anode chamber into said cathode chamber, drain outlet means for carrying electrolyte and any entrained particulate matter from the anode chamber;
A process of plating a planar face of a substrate with a metal layer in an electroplating cell wherein a cathode chamber of a plating bath contains an electrolyte in which the planar face of said substrate is immersed, said substrate being held in a plating position in said cathode chamber, an anode in an anode chamber contains a quantity of metal that is consumed during plating, a weir separates said anode chamber from said cathode chamber and permits the electrolyte to spill over from said cathode chamber into the anode chamber, said weir including means permitting metal ions to pass through from the anode chamber into said cathode chamber, drain outlet means carry electrolyte and any entrained particulate matter from the anode chamber;
A process of plating a planar face of a substrate with a metal layer in an electroplating cell wherein a cathode chamber of a plating bath contains an electrolyte in which the planar face of said substrate is immersed, said substrate being held in a plating position in said cathode chamber, an anode in an anode chamber contains a quantity of metal that is consumed during plating a weir separates said anode chamber from said cathode chamber and permits the electrolyte to spill over from said cathode chamber into the anode chamber, said weir including means permitting metal ions to pass through from the anode chamber into said cathode chamber, drain outlet means carry electrolyte and any entrained particulate matter from the anode chamber;
An electroplating cell for plating a planar face of a substrate with a metal layer, comprising a plating bath that contains an electrolyte in which said substrate is immersed in a cathode chamber thereof, sparger means for introducing the electrolyte into the bath, an anode chamber in which an anode is disposed and which contains a quantity of metal that is consumed during plating, a weir which separates said anode chamber from said cathode chamber and permits the electrolyte to spill over from the cathode chamber into the anode chamber, said weir including means for permitting metal ions to pass through from the anode chamber into said cathode chamber;
Dependencies are inferred from the claim text.