Method and apparatus for generating induced plasma
AssigneeFuji Electric Co., Ltd.
InventorsMasahiro Miyamoto, Mamoru Yamada, Tadahiro Sakuta
Life of this patent
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Abstract
An induced plasma generating apparatus comprises: a seed gas supply unit for supplying a seed gas, a first chamber for receiving the seed gas: a DC current source; a pair of electrodes connected to the DC current source for causing a discharge in the first chamber to generate a plasma from the seed gas; a nozzle for ejecting the plasma from the first chamber; a second chamber for receiving the plasma ejected from the first chamber; an AC current source; and a coil connected to the AC current source and disposed to surround the second chamber for producing a magnetic field in the second chamber. An induced plasma is generated by subjecting plasma in the second chamber to the magnetic field.
Claims14
A method of generating an induced plasma comprising:
- a first step of generating a plasma by causing a discharge between paired electrodes with a DC power source in a first chamber containing a seed gas;
- a second step of feeding said plasma into a second chamber containing a sheath gas;
- and
- a third step of generating an induced plasma by supplying an AC current to a coil surrounding said second chamber for causing a magnetic field generated by said AC current to act on said plasma in said second chamber, wherein the frequency of said AC current is not higher than 500 KHZ.
An induced plasma generating apparatus comprising:
- seed gas supply means for supplying a seed gas;
- a first chamber for receiving said seed gas;
- a DC power source for generating a DC voltage;
- a pair of electrodes connected to said DC power source for causing a discharge in said first chamber in order to generate a plasma from said seed gas;
- a nozzle for ejecting said plasma from said first chamber;
- a second chamber for receiving said plasma ejected from said first chamber through said nozzle;
- sheath gas supply means for supplying a sheath gas to said second chamber;
- an AC power source for generating an AC current wherein the frequency of said AC current is not higher than 500 KHZ;
- and
- a coil connected to said AC power source and disposed to surround said second chamber for producing a magnetic field in said second chamber to generate an induced plasma from said plasma.
Dependencies are inferred from the claim text.