Method of making X-ray mask having reduced stress
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsKenji Marumoto, Hideki Yabe, Sunao Aya, Koji Kise, Kei Sasaki
Life of this patent
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Abstract
A method of making a X-ray mask including: a step of forming a X-ray absorber above a substrate; a step of controlling a stress of the X-ray absorber by a predetermined condition; and wherein the predetermined condition for controlling the stress of the X-ray absorber formed above the substrate is determined by a measured value of a stress of a X-ray absorber formed on a monitor substrate.
Claims7
A method of making an X-ray mask having reduced stress comprising:
- preparing a mask substrate and a monitor substrate made of the same materials and having the same X-ray transmitting membrane structure;
- measuring bowing of the monitor substrate;
- subsequently, simultaneously depositing substantially identical X-ray absorbing films to form an X-ray mask on the mask substrate and a monitor mask on the monitor substrate whereby the X-ray mask and the monitor mask are similarly bowed;
- thereafter, measuring bowing of the monitor mask;
- annealing the monitor mask at a first annealing temperature and measuring bowing of the monitor mask after annealing;
- from the first annealing temperature and a change in bowing of the monitor mask due to annealing at the first temperature, estimating a second annealing temperature at which bowing of the X-ray mask will be eliminated;
- and
- annealing the X-ray mask at the second temperature.
A method of making an X-ray mask having reduced stress comprising:
- preparing a mask substrate and a monitor substrate made of the same materials and having the same X-ray transmitting membrane structure;
- measuring bowing of the monitor substrate;
- subsequently, simultaneously depositing substantially identical X-ray absorbing films to form an X-ray mask on the mask substrate and a monitor mask on the monitor substrate whereby the X-ray mask and the monitor mask are similarly bowed;
- thereafter, measuring bowing of the monitor mask;
- implanting ions in the monitor mask at a first dosage and measuring bowing of the monitor mask after implanting ions;
- from the first dosage and a change in bowing of the monitor mask due to implanting ions at the first dosage, estimating a second ion implantation dosage at which bowing of the X-ray mask will be eliminated;
- and
- implanting ions into the X-ray mask at the second dosage.
A method of making an X-ray mask having reduced stress comprising:
- preparing a mask substrate and a monitor substrate made of the same materials;
- measuring bowing of the monitor substrate;
- subsequently, simultaneously depositing substantially identical X-ray absorbing films having patterns and films having the same pattern as the X-ray absorbing films to form an X-ray mask on the mask substrate and a monitor mask on the monitor substrate whereby the X-ray mask and the monitor mask are similarly bowed;
- measuring bowing of the monitor mask;
- annealing the monitor mask at a first annealing temperature and measuring bowing of the monitor mask after annealing;
- from the first annealing temperature and a change in bowing of the monitor mask due to annealing at the first temperature, estimating a second annealing temperature at which bowing of the X-ray mask will be eliminated;
- and
- annealing the X-ray mask at the second temperature.
Dependencies are inferred from the claim text.