Simplified vector-format pattern generation
AssigneeCanon Kabushiki Kaisha
InventorKunio Seto
Life of this patent
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Abstract
A character pattern generating method and apparatus which enables storage of a large amount of font data with a small memory capacity and increase pattern-bitmapping speed. The apparatus stores element information representing common elements for constructing patterns and construction information indicating the construction of each pattern in a font data memory such as a ROM. The sets of element information corresponding to a specified pattern are developed into bitmap data in an element bitmap area. The bitmapped data are synthesized in accordance with construction information for the pattern to be generated.
Claims12
A character pattern generating apparatus comprising:
- calculating means for, first, calculating a scale factor of a character based on a basic size and a designated size of the character;
- calculating means for, second, calculating a size of a stroke element which is at least part of a stroke of the character based on the scale factor of the character calculated by said first-calculating means and a basic size of the stroke element;
- calculating means for, third, calculating a scale factor of an element pattern to be generated, similar to the stroke element, based on the size of the stroke element calculated by said second-calculating means and a basic size of a common element pattern, said common element pattern being changed to stroke elements different in size by being extended or reduced in accordance with a scale factor of an element pattern;
- calculating means for, fourth, calculating coordinate values of the element pattern to be generated based on coordinate values of the common element pattern and the scale factor of the element pattern to be generated calculated by said third-calculating means;
- and
- generating means for generating an element pattern which is at least part of the stroke of the character pattern to be generated, based on the coordinate values of the element pattern to be generated calculated by said fourth-calculating means to obtain the character pattern composed of generated element patterns.
A character pattern generating method comprising the steps of:
- first calculating a scale factor of a character based on a basic size and a designated size of the character;
- second calculating a size of a stroke element which is at least part of a stroke of the character based on the scale factor of the character calculated in said first calculating step and a basic size of the stroke element;
- third calculating a scale factor of an element pattern to be generated, similar to the stroke element, based on the size of the stroke element calculated in said second calculating step and a basic size of a common element pattern, said common element pattern being changed to stroke elements different in size by being extended or reduced in accordance with a scale factor of an element pattern;
- fourth calculating coordinate values of the element pattern to be generated based on coordinate values of the common element pattern and the scale factor of the element pattern to be generated calculated in said third calculating step;
- and
- generating an element pattern composing the stroke of the character pattern to be generated, based on the coordinate values of the element pattern to be generated calculated in said fourth calculating step to obtain the character pattern composed of generated element patterns.
Dependencies are inferred from the claim text.