Mass selective notch filter with quadrupole excision fields
AssigneeHewlett-Packard Company
InventorsCurt A. Flory, Stuart C. Hansen, Carl Myerholtz
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AssigneeHewlett-Packard Company
InventorsCurt A. Flory, Stuart C. Hansen, Carl Myerholtz
Estimating the term…
A notch filter for selectively removing a target ion with a specific mass-to-charge ratio from an ion beam is provided. The notch filter uses a quadrupole and a power supply for generating an rf electrical potential in the quadrupole. The quadrupole has two pairs of parallel electrodes of opposite polarities. Each pair is comprised of two parallel electrodes having equal electrical potential. The rf electrical potential generated by the power supply is a superposition of an rf quadrupole frequency component and an excision frequency component. The quadrupole has an inlet end and an outlet end and the ion beam traverses from the inlet end to the outlet end. As a result of the rf quadrupole frequency component, ions of above a selected mass-to-charge ratio are guided down the quadrupole. The excision frequency component, which is at the second harmonic of the dominant resonant frequency of the target ion, causes the target ion to resonate and be removed from the ion beam before exiting the quadrupole.
A notch filter for selectively removing a target ion with a specific mass-to-charge ratio from an ion beam, comprising:
A method for selectively removing a target ion with a specific mass-to-charge ratio from an ion beam;
A method of making a notch filter for selectively removing a target ion with a specific mass-to-charge ratio from an ion beam, comprising:
A method for selectively removing a target ion with a specific mass-to-charge ratio from an ion beam, comprising:
Dependencies are inferred from the claim text.