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US 5,672,644 AGranted
Light resistant polyphenylene ether resin compositions
AssigneeGeneral Electric Company
InventorKazushige Inoue
Life of this patent
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Abstract
Compositions of polyphenylene ether resins and a hindered amine compound that contains an amino group, optionally with polystyrene or modified polystyrene resins, provide improved light resistance over compositions containing a hindered amine compound without an amino group. Good impact resistance and heat resistance are maintained in the present compositions.
Claims12
A heat resistant composition comprising:
- (a) 100 parts by weight of at least one polyphenylene ether resin or a mixture of a polyphenylene ether resin and a styrene resin, wherein at least one of the polyphenylene ether resin or styrene resin is modified with at least one modifier compound selected from the group consisting of acid, acid anhydride, and epoxy compounds;
- and
- (b) 0.5 to 5 parts by weight of a hindered amine compound represented by the following formula:
- ##STR5## wherein R.sub.a and R.sub.b are independently C.sub.1 -C.sub.8 alkyl groups, Y is a hydrogen atom, an alkyl group, or a phenylalkyl group.
1 more element
A heat resistant composition consisting essentially of:
- a) 100 parts by weight of at least one polyphenylene ether resin or a mixture of a polyphenylene ether resin and a styrene resin, wherein at least one of the polyphenylene ether resin or styrene resin is modified with at least one modifier compound selected from the group consisting of acid, acid anhydride, and epoxy compounds;
- and
- (b) 0.5 to 5 parts by weight of a hindered amine compound
- represented by the following formula:
- ##STR6## wherein R.sub.a and R.sub.b are independently C.sub.1 -C.sub.8 alkyl groups, Y is a hydrogen atom, an alkyl group, or a phenylalkyl group.
2 more elements
Dependencies are inferred from the claim text.