Cleaning compositions for removing etching residue with hydroxylamine, alkanolamine, and chelating agent
AssigneeEKC Technology, Inc.
InventorWai Mun Lee
Life of this patent
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Abstract
A stripping and cleaning composition for removing resists and etching residue from substrates containing hydroxylamine and at least one alkanolamine is described. Further, a cleaning composition for removing etching residue from semiconductor substrates containing hydroxylamine, at least one alkanolamine, at least one chelating agent, and water is described. The preferred chelating agent is 1,2-dihydroxybenzene or a derivative thereof. The chelating agent provides added stability and effectiveness to the cleaning composition.
Claims8
A composition for removing etching residue from a substrate consisting essentially of about 5-50% by weight of hydroxylamine;
- about 10-80% by weight of at least one alkanolamine which is miscible with said hydroxylamine;
- an effective amount of up to about 30% by weight of at least one compound selected from the group consisting of (1) a compound having a formula I as follows:
- ##STR7## wherein R.sub.1 and R.sub.2 can be either H, t-butyl, OH, or COOH, (2) a compound having a formula II as follows:
- ##STR8## where R.sub.3 is OH or COOH, and (3) an ethylene diamine tetracarboxylic acid having a formula III as follows:
- ##STR9## where R.sub.4, R.sub.5, R.sub.6 and R.sub.7 can be either H or NH.sub.4, and an ammonium salt thereof;
- and a balance of water, wherein the hydroxylamine, the at least one alkanolamine and said at least one compound are present in sufficient amounts to remove etching residue from a substrate.
Product produced by combining about 5-50% by weight of hydroxylamine;
- about 10-80% by weight of at least one alkanolamine which is miscible with said hydroxylamine;
- an effective amount of up to about 30% by weight of at least one compound selected from the group consisting of (1) a compound having a formula I as follows:
- ##STR10## wherein R.sub.1 and R.sub.2 can be either H, t-butyl, OH or COOH, (2) a compound having a formula II as follows:
- ##STR11## wherein R.sub.3 is OH or COOH, and (3) an ethylene diamine tetracarboxylic acid compound having a formula III as follows:
- ##STR12## where R.sub.4, R.sub.5, R.sub.6 and R.sub.7 can be either H or NH.sub.4, and an ammonium salt thereof;
- and a balance of water, wherein the hydroxylamine, the at least one alkanolamine and said at least one compound are present in sufficient amounts to remove etching residue from a substrate.
Dependencies are inferred from the claim text.