Multi-value level type non-volatile semiconductor memory unit and method of rewriting the same
AssigneeNippon Steel Corporation
InventorYugo Tomioka
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AssigneeNippon Steel Corporation
InventorYugo Tomioka
Estimating the term…
A non-volatile semiconductor memory unit comprises a memory cell having a semiconductor substrate, a control gate formed over the semiconductor substrate, an electric charge accumulative layer formed between the semiconductor substrate and the control gate, and a source and drain, both formed in the semiconductor substrate. The memory cell stores N-valued data (N being an integer more than 3) by accumulating an electric charge in the electric charge accumulative layer. A detector is provided for detecting a storage state before data rewrite of the memory cell. A comparison circuit compares the storage state before data rewrite, with a storage state after data rewrite to produce a difference therebetween. A rewrite circuit is included for rewriting the storage state of the memory cell by applying N-1 levels of predetermined voltages to the source, the drain and control gate of the memory cell, respectively, in accordance with the produced difference.
A non-volatile semiconductor memory unit comprising:
A non-volatile semiconductor memory unit according to claim 3, wherein said rewrite means comprises change means for changing the application time of each of said predetermined voltages.
A method of rewriting a non-volatile semiconductor memory unit, said non-volatile semiconductor memory unit comprising a memory cell which has a semiconductor substrate, a control gate formed over said semiconductor substrate, an electric charge accumulative layer formed between said semiconductor substrate and said control gate, and a source and drain both of which are formed in said semiconductor substrate, said memory cell storing tertiary or more data by accumulating electric charge in said electric charge accumulative layer;
A non-volatile semiconductor memory unit comprising:
A method of rewriting a non-volatile semiconductor memory unit, said non-volatile semiconductor memory unit comprising a memory cell which has a semiconductor substrate, a control gate formed over said semiconductor substrate, an electric charge accumulative layer formed between said semiconductor substrate and said control gate, and a source and drain both of which are formed in said semiconductor substrate, said memory cell storing N-valued data (N being an integer more than 3) by accumulating electric charge in said electric charge accumulative layer;
A non-volatile semiconductor memory unit comprising:
A method of rewriting a non-volatile semiconductor memory unit, said non-volatile semiconductor memory unit comprising a memory cell which has a semiconductor substrate, a control gate formed over said semiconductor substrate, an electric charge accumulative layer formed between said semiconductor substrate and said control gate, and a source and drain, both formed in said semiconductor substrate, said memory cell storing N-valued data (N is an integer more than 3) by accumulating electric charge in said electric charge accumulative layer;
A non-volatile semiconductor memory unit including a memory cell having a semiconductor substrate, a control gate formed over said semiconductor substrate, an electric charge accumulative layer formed between said semiconductor substrate and said control gate, and a source and drain, both formed in said semiconductor substrate, said memory cell storing N-valued data (N being an integer more than 3) by accumulating electric charge in said electric charge accumulative layer, comprising:
Dependencies are inferred from the claim text.