Scan type exposure apparatus
AssigneeNikon Corporation
InventorsTsuyoshi Naraki, Kei Nara
Life of this patent
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AssigneeNikon Corporation
InventorsTsuyoshi Naraki, Kei Nara
Estimating the term…
A scan type exposure apparatus has a mask stage for mounting a mask formed with an exposure pattern in a pattern area; a substrate stage for mounting a rectangular photosensitive substrate; a driving unit for moving the mask stage and the substrate stage in synchronism parallel to one side of the rectangular photosensitive substrate; illumination optical systems for illuminating partial areas of the mask with light beams; and projection optical systems for projecting images of the illuminated areas of the mask onto the photosensitive substrate. The projection optical system projects the light beams passing through the exposure pattern area of the illuminated mask on a central area, excluding peripheral areas, of an exposure area of the photosensitive substrate and projects the light beams passing through an area other than the exposure pattern area of the illuminated mask on the peripheral areas. The scan type exposure apparatus also has an exposure quantity control unit for setting an exposure quantity for the peripheral areas larger than an exposure quantity for the central area.
A scan type exposure apparatus, comprising:
A scan type exposure apparatus, comprising:
A scan type exposure apparatus, comprising:
A method for exposing a photosensitive substrate in which exposure is performed by transmitting a plurality of light beams through a plurality of partial areas, respectively, of a mask having an exposure pattern, to corresponding portions of an exposure area of a photosensitive substrate, said method comprising:
Dependencies are inferred from the claim text.