Charged particle beam exposure compensating proximity effect
AssigneeFujitsu Limited
InventorHiroyuki Kanata
Life of this patent
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Abstract
A subject pattern and a lower layer pattern are divided into small regions of a constant dimension using identical mesh of division. Considering of the spreading of charged particle beam due to backward scattering, the small region is set to be, for example, a few .mu.m square. An irradiation energy on each small region is determined by taking backward scattering from lower level pattern into account. Calculation is simplified because a pattern is represented by a pattern areal density. A region with a lower level pattern and a region without a lower level pattern can be exposured by charged particle beam with a comparable accuracy.
Claims4
A charged particle beam exposure method for exposing a pattern with a charged particle beam, comprising the steps of:
- dividing data of a pattern to be exposed on a surface layer of a substrate into small regions of a predetermined dimension;
- calculating area density of the pattern within each divided small region;
- dividing data of a pattern of a lower level structure into small regions of a predetermined dimension, the lower level pattern being formed within the substrate having the surface layer which is to be patterned;
- calculating area density of the lower level pattern within each divided small region;
- calculating a main exposure intensity for irradiating a pattern on the surface layer for each small region based on total scattering intensity depending on the area density of the pattern on the surface layer and the area density of the pattern on the lower level layer;
- and
- exposing each small region of the surface layer with a charged particle beam based on the calculated main exposure intensity for the charged particle beam.
Dependencies are inferred from the claim text.