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US 5,667,880 AGranted
Electroconductive antireflection film
AssigneeFuji Photo Optical Co., Ltd.
InventorMasayuki Okaniwa
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Abstract
An electroconductive antireflection film with a laminated structure is composed of at least four oxide layers, including a plurality of high-refractive-index layers and a plurality of low-refractive-index layers, at least one of the high-refractive-index layers serving as a transparent electroconductive layer and one of the low-refractive-index layers serving as a surface layer.
Claims3
An electroconductive antireflection film having a laminated structure, comprising:
- a substrate,
- a transparent electroconductive layer comprising indium tin oxide disposed adjacent the substrate,
- at least two first oxide layers having a refractive index within a first range,
- at least two second oxide layers having a refractive index within a second range, the second range being lower than the first range,
- the at least two first oxide layers and the at least two second oxide layers comprising oxide layers prepared by a sputtering method and being disposed in an alternating arrangement,
- at least one of the two first oxide layers comprising titanium oxide disposed adjacent the transparent electron conductive layer,
- at least one of the two second oxide layers comprising silicon oxide disposed adjacent the at least one of the two first oxide layers comprising titanium oxide, and
- at least one of the at least two second oxide layers comprising a surface layer of the electroconductive antireflection film.
5 more elements
Dependencies are inferred from the claim text.