Method of making color screens for FED and other cathodoluminscent displays

A method for use in the construction of a color display screen using electrodeposition of a plurality of electroluminescent materials onto a conductive layer on a substrate bearing said screen, comprising the forming operations a), b), and c) in any sequence, followed by operations d) and e):

• a) forming on said conductive layer a first pattern of deposition sites covered with a first material selectively strippable by a first agent,
• b) forming on said conductive layer a second pattern of deposition sites covered with a second material strippable by a second agent but not significantly attacked by said first agent,
• c) forming on said conductive layer an insulative matrix surrounding said first and second patterns of deposition sites, and thereafter,
• d) performing a first stripping of said first material with said first agent to reveal first deposition sites within said insulative matrix and performing a first electrodepositing of a first electroluminescent material within said first revealed deposition sites, and
• following said first stripping and depositing:
• e) stripping said second material with said second agent to reveal second deposition sites within said insulative matrix and electrodepositing a second electroluminescent material within said second revealed deposition sites,
• whereby the said forming operations are segregated from the electroluminescent material electrodepositing operations.

A method for use in the construction of a color display screen using electrodeposition of a plurality of phosphor materials onto a conductive layer on a substrate bearing said screen, comprising the forming and electrodeposition operations a), b), c) and d), followed by operations e) and f):

• a) forming on said conductive layer a matrix surrounding first, second and third patterns phosphor deposition sites,
• b) photolithographically forming on said conductive layer on said first pattern of phosphor deposition sites a first material selectively strippable by a first agent,
• c) photolithographically forming on said conductive layer on said second pattern of phosphor deposition sites a second material strippable by a second agent but not significantly attacked by said first agent,
• d) electrodepositing a first phosphor material on said conductive layer on said third pattern of phosphor deposition sites,
• e) performing a first stripping of one of said first and second materials with the associated one of said first and second agents to reveal one of said first and second patterns of phosphor deposition sites within said matrix and performing a second electrodepositing of a second phosphor material within said revealed deposition sites, and
• f) stripping the other of said first and second materials with the other of said first and second agents to reveal the other of said first and second patterns of phospor deposition sites within said matrix and electrodepositing a third phosphor material within said other revealed deposition sites, whereby the said photolithographic forming operations are segregated from the phosphor material electrodepositing operations.