Programmable apparatus for cleaning semiconductor elements

An apparatus for cleaning a plurality of semiconductor elements comprising:

• a chamber, said chamber providing a sealed environment to perform said cleaning of said elements;
• a rotation structure which rotates within said chamber, said rotation structure supporting said elements and spinning said elements around two spaced apart rotational axes;
• at least one nozzle to spray liquids onto said elements;
• at least one liquid supply to supply a liquid for immersing said elements in said chamber;
• at least one drain to remove a liquid from said chamber;
• at least one gas supply to supply a gas to said chamber to dry said elements;
• at least one vent to vent gas and vapors from said chamber;
• a motor connected to said rotation structure for turning said rotation structure within said chamber and for spinning said elements;
• and
• a means for programming and controlling the operation of said apparatus;
• said rotation structure further comprising a first means for providing rotation around a first rotational axis perpendicular to said rotation structure, said first rotational axis passing through the radial center of said rotation structure;
• a second means for providing rotation around a second rotational axis perpendicular to said element surface and spaced from said first rotational axis
• a vertical shaft from said motor to said rotation structure for transferring said rotation around said first rotational axis from said motor through said vertical shaft;
• a chuck located radially outward from said shaft for holding said elements during said spinning;
• and
• a transfer means for transferring rotation around said first rotation axis to said second rotational axis, said rotation around said second rotational axis being opposite from said rotation around said first rotational axis.