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US 5,665,688 AGranted
Photoresist stripping composition
AssigneeOlin Microelectronics Chemicals, Inc.
InventorsKenji Honda, Donald F. Perry, Taishih Maw
Life of this patent
Estimating the term…
Abstract
A photoresist stripping composition containing: (a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5; (b) 70-20% by weight of alkanolamine compounds; and (c) 0.1-10% by weight of 6,6',6"-(1,3,5-triazine-2,4,6-triyltriimino) tris(hexanoic acid).
Claims3
A photoresist stripper composition comprising:
- (a) from about 20 to about 70% by weight of a cyclic amide organic polar solvent having a dipole moment of more than 3.5;
- (b) from about 70 to about 20% by weight of an alkanolamine compound;
- and
- (c) from about 0.1 to about 10% by weight of 6,6',6"-(1,3,5-triazine-2,4,6-triyltriimino) tris(hexanoic acid);
- all percents based on the weight of the stripper composition.
2 more elements
Dependencies are inferred from the claim text.