Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern
AssigneeNitto Denko Corporation
InventorsToshihiko Omote, Hirofumi Fujii
Life of this patent
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Abstract
A photoresist composition which can form a negative pattern with good heat resistance upon irradiation with actinic rays can be prepared by adding a 4-(2'-nitrophenyl)-1-alkyl (or alkoxyl)-4-dihydropyridine as a photosensitive compound which shows basicity by the irradiation with actinic rays to a resin component comprising a polyimide precursor having a specific structure.
Claims6
A heat-resistant negative photoresist composition consisting essentially of a resin component containing a structural unit represented by formula (I):
- ##STR3## wherein the arrows each indicates a bond which can be substituted by isomerization, R.sub.1 represents a tetravalent aromatic or aliphatic hydrocarbon residue, and R.sub.2 represents a divalent aromatic or aliphatic hydrocarbon residue, and
- a compound represented by formula (II) which shows basicity upon irradiation with actinic rays:
- ##STR4## wherein R.sub.3 and R.sub.4 each represents a hydrogen atom or an alkyl group containing 1 to 3 carbon atoms, R.sub.5 and R.sub.6 each is one selected from the group consisting of an alkyl group containing 1 to 4 carbon atoms, an alkoxyl group containing 1 to 4 carbon atoms, an anilino group, a toluidino group, a benzyloxy group, an unsubstituted amino group and a dialkylamino group, R.sub.7 is an alkyl group containing 1 to 3 carbon atoms, an alkoxyl group containing 1 to 3 carbon atoms or an alkoxyalkyl group, and X.sub.1 to X.sub.4 each is one selected from the group consisting of a hydrogen atom, a fluorine atom, a nitro group, a methoxy group, a dialkylamino group, an unsubstituted amino group, a cyano group and a fluorinated alkyl group.
A photosensitive substrate comprising a substrate having coated on the surface of the substrate a heat-resistant negative photoresist composition consisting essentially of a resin component containing a structural unit represented by formula (I):
- ##STR5## wherein the arrows each indicates a bond which can be substituted by isomerization, R.sub.1 represents a tetravalent aromatic or aliphatic hydrocarbon residue, and R.sub.2 represents a divalent aromatic or aliphatic hydrocarbon residue, and
- a compound represented by formula (II) which shows basicity upon irradiation with actinic rays:
- ##STR6## wherein R.sub.3 and R.sub.4 each represents a hydrogen atom or an alkyl group containing 1 to 3 carbon atoms, R.sub.5 and R.sub.6 each is one selected from the group consisting of an alkyl group containing 1 to 4 carbon atoms, an alkoxyl group containing 1 to 4 carbon atoms, an anilino group, a toluidino group, a benzyloxy group, an unsubstituted amino group and a dialkylamino group, R.sub.7 is an alkyl group containing 1 to 3 carbon atoms, an alkoxyl group containing 1 to 3 carbon atoms or an alkoxyalkyl group, and X.sub.1 to X.sub.4 each is one selected from the group consisting of a hydrogen atom, a fluorine atom, a nitro group, a methoxy group, a dialkylamino group, an unsubstituted amino group, a cyano group and a fluorinated alkyl group.
Dependencies are inferred from the claim text.