Chemical vapor deposition method for depositing diamond using a high temperature vacuum substrate mount

Abstract

A method for the chemical vapor deposition of diamond includes the steps of: (a) applying a thermally conductive paint between a substrate seed crystal and an end surface of a vacuum line [having an inner surface and an outer surface], the vacuum line protruding through a mount; (b) holding within a chemical vapor deposition flame the substrate seed crystal upon the mount by applying a vacuum to the substrate seed crystal via the vacuum line protruding through the mount, wherein a portion of an outer surface of the vacuum line in contact with the mount is coated with a thermally conductive lubricant; (c) flowing a heat exchanging fluid through the mount to maintain the surface of the substrate seed crystal at a temperature suitable for chemical vapor deposition of diamond; and (d) directing a deposition species for chemical vapor deposition to deposit diamond onto a surface of the substrate seed crystal.

Dependencies are inferred from the claim text.