Substrate processing method and apparatus
AssigneeFujitsu Limited
InventorMitsuo Takeuchi
Life of this patent
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Abstract
A substrate processing method includes the steps of accommodating a plurality of substrates within a carrier, where the carrier has a bottom that is open and has a function of stopping inclination of the substrates, transporting the substrates and the carrier to a processing chamber by a transport mechanism having a function of supporting weights of the substrates, and carrying out a process on the substrates within the processing chamber.
Claims20
A substrate processing method comprising the steps of:
- (a) accommodating a plurality of substrates within a carrier, said carrier having a bottom that is open and having a function of stopping inclination of the substrates;
- (b) transporting the substrates and the carrier to a processing chamber by a transport means having a function of supporting weights of the substrates, said transport means being independent of said carrier;
- and
- (c) carrying out a process on the substrates within the processing chamber.
A substrate processing apparatus comprising:
- transport means for transporting a plurality of substrates and a carrier, that accommodates the substrates, by supporting weights of the substrates, said carrier having a bottom that is open and having a function of stopping inclination of the substrates, said transport means being independent of said carrier;
- and
- processing chamber supporting the substrates and the carrier transported by said transport means and subjecting the substrates to a process.
A substrate processing apparatus comprising:
- transport means for transporting a plurality of substrates and a carrier, that accommodates the substrates, by supporting weights of the substrates, said carrier having a bottom that is open and having a function of stopping inclination of the substrates;
- and
- processing chamber supporting the substrates and the carrier transported by said transport means and subjecting the substrates to a process,
- said transport means including a sawtooth shaped portion having undulations with a pitch that is smaller than a pitch of the substrates accommodated within the carrier,
- said sawtooth shaped portion being provided at each part of said transport means supporting the weights of the substrates after the substrates and the carrier are released by the transport means.
A substrate processing apparatus comprising:
- transport means for transporting a plurality of substrates and a carrier, that accommodates the substrates, by supporting weights of the substrates, said carrier having a bottom that is open and having a function of stopping inclination of the substrates;
- and
- processing chamber supporting the substrates and the carrier transported by said transport means and subjecting the substrates to a process,
- said processing chamber having a support on which the substrates and the carrier are placed within said processing chamber, said support having a function of supporting wights of the substrates and the carrier within said processing chamber after the substrates and the carrier are released by said transport means,
- said support including a sawtooth shaped portion having undulations with a pitch that is smaller than a pitch of the substrates accommodated within the carrier, said sawtooth shaped portion being provided at each part of said support supporting the weights of the substrates within said processing chamber after the substrates and the carrier are released by the transport means.
A method of transporting substrates comprising the steps of:
- (a) accommodating a plurality of substrates within a carrier, said carrier having a bottom that is open and having a function of stopping inclination of the substrates;
- and
- (b) transporting the substrates and the carrier by a transport means having a function of supporting weights of the substrates, said transport means being independent of the carrier.
Dependencies are inferred from the claim text.