US 5,659,390 AGranted

Method and apparatus for detecting particles on a surface of a semiconductor wafer having repetitive patterns

AssigneeInspex, Inc.

InventorJoseph J. Danko

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Abstract

An apparatus for detecting particles on the front surface of a patterned semiconductor wafer having repetitive patterns includes a laser for illuminating an area on the front surface at grazing angle of incidence with a beam of polarized light. A lens collects light scattered from the area and forms a Fourier diffraction pattern of the area illuminated. A Fourier mask blocks out light collected by the lens at locations in the Fourier diffraction pattern where the intensity is above a predetermined level indicative of background information and leaves in light at locations where the intensity is below the threshold level indicative of possible particle information. The Fourier mask includes an optically addressable spatial light modulator and a crossed polarizer with the Fourier diffraction pattern being used as both a read beam and a write beam for the spatial light modulator. A camera detects scattered light collected from the area by the lens and not blocked out by the Fourier mask.

Claims5

Dependent claims

Apparatus for detecting particles on a surface of a semiconductor wafer, said surface having repetitive patterns, the apparatus comprising:

a. means for illuminating an area on said surface with a beam of polarized light,
b. a first lens for collecting light scattered from said area, said first lens forming a Fourier diffraction pattern of scattered light collected from said area, said light in said Fourier diffraction pattern being polarized,
c. a Fourier mask for blocking light in said Fourier diffraction pattern where the intensity is above a predetermined threshold level and leaving in light in said Fourier diffraction pattern where the intensity is below said predetermined threshold level, said light in said Fourier diffraction pattern where the intensity is above said predetermined threshold level being indicative of background information and said light in said Fourier diffraction pattern where the intensity is below said predetermined threshold level being indicative of particle information, the Fourier mask including a spatial light modulator for rotating the polarization of light below said predetermined threshold level and a crossed polarizer for receiving light from the spatial light modulator and blocking light received whose polarization has not been rotated, said spatial light modulator being optically addressable and including a photoconductive layer which serves as an optical addressing material for a write beam and a liquid crystal layer which serves as a light modulating material for a read beam,
d. means for imaging the Fourier diffraction pattern formed by the first lens onto the photoconductive layer in the spatial light modulator as the write beam and also onto the liquid crystal layer in the spatial light modulator as the read beam, the image on the photoconductive layer being aligned with the image on the liquid crystal layer,
e. areas on the image on the photoconductive layer where the intensity of the image of the Fourier diffraction pattern is below said predetermined threshold level causing the polarization of corresponding areas of the image on the liquid crystal layer to be rotated 90 degrees, and
f. a detector for detecting light collected by the first lens and not blocked by the Fourier mask.

3 more elements

Apparatus for detecting particles on a surface of a semiconductor wafer, said surface having repetitive patterns, the apparatus comprising:

a. means for illuminating an area on said surface with a beam of polarized light,
b. a first lens for collecting light scattered from said area, said first lens forming a Fourier diffraction pattern of scattered light collected from said area said light in said Fourier diffraction pattern being polarized,
c. a Fourier mask for blocking light in said Fourier diffraction pattern where the intensity is above a predetermined threshold level and leaving in light in said Fourier diffraction pattern where the intensity is below said predetermined threshold level, said light in said Fourier diffraction pattern where the intensity is above said predetermined threshold level being indicative of background information and said light in said Fourier diffraction pattern where the intensity is below said predetermined threshold level being indicative of particle information, the Fourier mask means including a spatial light modulator for rotating the polarization of light below said predetermined threshold level and a crossed polarizer for receiving light from the spatial light modulator and blocking light received whose polarization has not been rotated, said spatial light modulator being optically addressable and including a photoconductive layer which serves as an optical addressing material and a liquid crystal layer which serves as a light modulating material,
d. means for imaging the Fourier diffraction pattern formed by the first lens onto the photoconductive layer in the spatial light modulator,
e. means for generating a video image of the Fourier diffraction pattern and then imaging the video image so generated onto the liquid crystal layer in the spatial light modulator,
f. the image on the photoconductive layer being aligned with the image on the liquid crystal layer, and
g. areas on the image of the photoconductive layer where the intensity of the image of the Fourier diffraction pattern is below said predetermined threshold level causing the polarization of corresponding areas of the image on the liquid crystal layer to be rotated 90 degrees,
h. a detector for detecting light collected by said first lens and not blocked by said Fourier mask.

5 more elements

Dependencies are inferred from the claim text.