Method of forming coating film and apparatus therefor

A method of forming a coated film, comprising the steps of:

• applying a solvent of a coating solution on one surface of a substrate which is rotating, from a nozzle means;
• rotating said substrate having solvent applied thereto to diffuse the solvent over the entire area of said one surface;
• and
• applying an amount of coating solution onto the substantially center portion of said substrate for a predetermined period of time while, from a nozzle means, which results in spreading of the coating solution to the peripheral portion of said substrate in order to form the coated film of a uniform thickness.

A method of forming a coated film, comprising the steps of:

• applying a solvent of a coating solution on one surface of a substrate which is rotating;
• rotating said substrate having solvent applied thereto to diffuse the solvent over the entire area of said one surface;
• and
• sequentially applying the coating solution from a nozzle onto the substantially central portion of said substrate over an initial period when the discharge flow rate of the coating solution gradually increases, an intermediate period when the discharge flow rate is substantially constant, and the last period when the discharge flow rate gradually decreases while rotating said substrate, thereby diffusing the coating solution over the entire area of said one surface of said substrate to form the coated film, wherein the last period is controlled.

A method of forming a coated film, comprising the steps of:

• applying a solvent of a coating solution on one surface of a substrate which is rotating;
• rotating said substrate having solvent applied thereto to diffuse the solvent over the entire area of said one surface;
• and
• sequentially applying the coating solution from a nozzle onto the substantially central portion of said substrate over an initial period when the discharge flow rate of the coating solution gradually increases, an intermediate period when the discharge flow rate is substantially constant, and the last period when the discharge flow rate gradually decreases while rotating said substrate, thereby diffusing the coating solution over the entire area of said one surface of said substrate to form the coated film, wherein at least the discharge time of the coating solution and the deceleration of the rate of rotation of the last period is controlled.

A method of forming a coated film, comprising the steps of:

• applying a solvent of a coating solution on one surface of a substrate which is rotating;
• rotating said substrate having solvent applied thereto to diffuse the solvent over the entire area of said one surface;
• and
• sequentially applying the coating solution from a nozzle onto the substantially central portion of said substrate over an initial period when the discharge flow rate of the coating solution gradually increases, an intermediate period when the discharge flow rate is substantially constant, and the last period when the discharge flow rate gradually decreases while rotating said substrate, thereby diffusing the coating solution over the entire area of said one surface of said substrate to form the coated film, wherein the respective discharge times of the initial period, an intermediate period, and the last period are independently controlled.

A method of forming a coated film, comprising the steps of:

• applying a solvent of a coating solution on one surface of a substrate which is rotating;
• rotating said substrate having solvent applied thereto to diffuse the solvent over the entire area of said one surface;
• controlling a pump to supply the coating solution to a nozzle through a supply path by said pump over an initial period when the discharge flow rate of the coating solution gradually increases, an intermediate period when the discharge flow rate is substantially constant, and the last period when the discharge flow rate gradually decreases so as to supply the coating solution onto the substantially central portion of said rotated substrate, thereby diffusing the coating solution over the entire area of said one surface of said substrate to form the coated film;
• and
• closing said supply path 0.1 to 1.2 sec after said pump is stopped;
• wherein at least one of the discharge time of the coating solution and the deceleration of the rate of rotation of the last period is controlled.

A method of forming a coated film, comprising the steps of:

• applying a solvent of a coating solution on one surface of a substrate which is rotating;
• rotating said substrate having solvent applied thereto at a first rotational speed to diffuse said solvent over the entire area of said one surface;
• and
• applying a coating solution onto the substantially center portion of said substrate while rotating said substrate at a second rotational speed, the first and second rotational speeds being substantially equal, which results in spreading of coating solution over the entire area of said one surface as evenly as possible to form a coated film of uniform thickness.

A method of forming a coating film, comprising the steps of:

• supplying a solvent of a coating solution on the center of one surface of a substrate which is being rotated or stopped from a first nozzle positioned above the center of the substrate;
• moving the first nozzle to the outside of the center of the substrate therefrom;
• rotating the substrate having solvent applied thereto to diffuse the solvent over the entire area of said one surface;
• moving a second nozzle above the center of the substrate from the outside thereof;
• and
• supplying a coating solution on the center of said one surface of the substrate while rotating the substrate, thereby diffusing the coating solution over the entire area of said one surface to form a coated film.