Single-wafer heat-treatment apparatus and method of manufacturing reactor vessel used for same
AssigneesHeraeus Quarzglas GmbH & Co. KG, Shin-Etsu Quartz Products Co., Ltd.
InventorsMasaaki Aoyama, Hiroyuki Miyazawa
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Abstract
A reactor vessel includes a quartz glass body having sidewalls and a ceiling formed as a single unit without welds. Translucent or opaque portions are formed by bubbles in the glass where heat insulation is desired and transparent portions are formed by absence of bubbles where heat transmission and visibility are desired. The body is formed by adding quartz glass powder to a mold which is rotated about a central axis so that centrifugal force causes a layer of powder to form on the inside of the mold. The layer is then heated until it melts.
Claims11
Apparatus for heat treating a wafer, said apparatus comprising
- a reactor vessel comprising a quartz glass body, said quartz glass body comprising ceiling means and sidewall means defining an enclosure having an open end with an outer periphery, said quartz glass body being formed as a unitary body without any welding and with bubbles distributed throughout at least a part of said body so as to render at least a part of said body translucent or opaque, said ceiling means being formed without bubbles, whereby said ceiling means is transparent,
- support means for supporting a wafer in a predetermined position in said enclosure defined by said quartz glass body, and
- heating means for heating a wafer supported at said predetermined position, said heating means comprising an infrared heater outside said reactor vessel and positioned to heat a wafer at said predetermined position.
Dependencies are inferred from the claim text.