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US 5,650,196 AGranted
Device for coating substrates in semiconductor production
AssigneeSteag MicroTech GmbH
InventorsEberhard Muhlfriedel, Karl Appich, Martin Kallis
Life of this patent
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Abstract
A device for coating substrates has a capillary slot which is used in a first step to apply lacquer to the substrate. In a second step, the lacquer layer thickness of the substrate is reduced and made more uniform by spinning in a spinning device.
Claims25
A device for coating substrates in two steps, comprising:
- an upwardly facing capillary slot for coating a downwardly facing surface to be coated of a substrate with a coating of a coating medium contained in said capillary slot;
- and
- a means for spinning the substrate so as to make the coating more uniform and thinner in a spinning operation by centrifugal forces acting on said coating;
- said means for spinning comprising a spinning station positioned adjacent to said capillary slot;
- and
- a linear transport device adapted to transport the substrate from said capillary slot to said spinning station.
3 more elements
A device for coating substrates in two steps, comprising:
- an upwardly facing capillary slot for coating a downwardly facing surface to be coated of a substrate with a coating of a liquid coating medium contained in said capillary slot;
- a means for spinning the substrate so as to make the coating more uniform and thinner in a spinning operation by centrifugal forces acting on said coating;
- a means for supplying the liquid coating medium to said capillary slot;
- wherein said means for supplying comprises an open channel to be partially filled to a filling level with the liquid coating medium and wherein said capillary slot is formed by two parallel plates immersed into the liquid coating medium filled into said channel, wherein the filling level is maintained constant by means of said means for supplying.
1 more element
A method for coating substrates, comprising the steps of:
- coating a downwardly facing surface of a substrate by passing the substrate over an upper end of a capillary slot containing a coating medium to produce a coated substrate with a coating on the downwardly facing surface thereof;
- transporting the substrate by means of a linear transport device from said capillary slot to a spinning station;
- and
- spinning the coated substrate so as to make the coating more uniform by centrifugal forces acting thereon during spinning.
1 more element
A method for coating substrates, comprising the steps of:
- providing a channel and partially filling to a filling level said channel with the liquid coating medium;
- arranging in said channel two parallel plates and immersing said two parallel plates in the liquid coating medium contained in said channel so that said two parallel plates define a capillary slot;
- coating a downwardly facing surface of a substrate by passing the substrate over an upper end of said capillary slot containing the coating medium to produce a coated substrate with a coating on the downwardly facing surface thereof;
- spinning the coated substrate so as to make the coating more uniform by centrifugal forces acting thereon during spinning.
1 more element
Dependencies are inferred from the claim text.