Method for manufacturing a semiconductor device
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsHisashi Ohtani, Akiharu Miyanaga, Takeshi Fukunaga, Hongyong Zhang
Life of this patent
Estimating the term…
Abstract
A process for fabricating a highly stable and reliable semiconductor, comprising: coating the surface of an amorphous silicon film with a solution containing a catalyst element capable of accelerating the crystallization of the amorphous silicon film, and heat treating the amorphous silicon film thereafter to crystallize the film.
Claims12
A method for manufacturing a semiconductor device comprising the steps of:
- disposing a crystallization promoting solution in contact with at least a portion of an amorphous silicon film on a substrate, said solution containing an element selected from the group consisting nickel (Ni), palladium (Pd), platinum (Pt), copper (Cu), silver (Ag), gold (Au), indium (In), tin (Sn), phosphorous (P), arsenic (As), and antinomy (Sb);
- and
- crystallizing said silicon film by heating;
- wherein a concentration of said element in said silicon film after said crystallizing is within a range from 1.times.10.sup.16 to 1.times.10.sup.19 atoms/cm.sup.3 and said solution contains said element at a concentration less than 200 ppm.
A method for manufacturing a semiconductor device comprising the steps of:
- disposing a solution in contact with a silicon film on a substrate, said solution containing nickel;
- drying said solution so that a continuous crystallization promoting layer containing nickel is formed;
- and
- crystallizing said silicon film by heating,
- said method further comprising the step of interposing an oxide film between said solution and said silicon film so that said nickel is diffused into said silicon film through said oxide film itself.
A method for manufacturing a semiconductor device comprising the steps of:
- disposing a solution in contact with an amorphous silicon film on a substrate, said solution containing nickel at less than 200 ppm;
- drying said solution so that a continuous crystallization promoting layer containing nickel is formed;
- and
- crystallizing said silicon film by heating,
- wherein said nickel is contained in said silicon film after said heating, at a concentration in the range from 1.times.10.sup.16 atoms/cm.sup.3 to 1.times.10.sup.19 atoms/cm.sup.3.
A method for manufacturing a semiconductor device comprising the steps of:
- adding a crystallization promoting material into a first region of a silicon film formed on a surface by disposing a solution containing said crystallization promoting material in contact with a selected portion of the silicon film;
- heating said silicon film in order that crystals grow from said first region toward a second region of the silicon film to which said crystallization promoting material is not directly added, and
- forming said semiconductor device by using said second region of the silicon film as an active region of said semiconductor device,
- wherein a concentration of said crystallization promoting material in said second region after said heating is within a range of 1.times.10.sup.16 to 5.times.10.sup.19 atoms/cm.sup.3.
A method for manufacturing a semiconductor device comprising the steps of:
- preparing a solution containing a compound dissolved or dispersed in a polar solvent, said compound including a crystallization promoting material;
- disposing said solution in contact with a silicon film;
- drying said solution to form a continuous layer containing said crystallization promoting material;
- and then
- crystallizing said silicon film by heating,
- wherein said solution includes an interfacial active agent.
A method for manufacturing a semiconductor device comprising the steps of:
- preparing a solution containing a compound dissolved or dispersed in a polar solvent, said compound including a crystallization promoting material;
- disposing said solution in contact with a silicon film;
- drying said solution to form a continuous layer containing said crystallization promoting material;
- and then
- crystallizing said silicon film by heating,
- said method, further comprising the step of interposing an oxide film between said solution and said silicon film so that said crystallization material is diffused into said silicon film through said oxide film itself .
Dependencies are inferred from the claim text.