Plasma CVD method of producing a gradient layer
AssigneeSchott Glaswerke
InventorsJurgen Otto, Johannes Segner, Volker Paquet
Life of this patent
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Abstract
The invention relates to a plasma CVD method for producing a gradient layer wherein the layer gradient is produced in the direction of layer growth by changing at least one plasma power parameter during the coating process. According to the invention, thin gradient layers are generated with high precision by supplying the plasma power in a pulsed manner and adjusting the layer gradient by changing the plasma power parameters of pulse amplitude, pulse duration and/or pulse interval.
Claims14
A plasma CVD method for producing a layer wherein a layer composition or structure gradient is generated in the direction of layer growth by changing at least one of plasma power parameters during the coating process, the method comprising the steps of:
- supplying a plasma power as a power pulse train in a plasma pulse CVD method wherein the pulse train has the parameters of pulse amplitude, pulse width and pulse interval;
- and,
- generating said layer gradient of said layer by changing at least one of said pulse amplitude, pulse width and pulse interval.
Dependencies are inferred from the claim text.