Back to results
US 5,636,066 AGranted
Optical apparatus
AssigneeNikon Corporation
InventorTomowaki Takahashi
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
AssigneeNikon Corporation
InventorTomowaki Takahashi
Estimating the term…
Exposure light from a pattern on a first surface advances through a first converging group, is then reflected at the periphery around an aperture on a first plane mirror, thereafter is reflected by a second converging group including a first concave reflecting mirror, and forms a first intermediate image of the pattern in the aperture of first plane mirror. A beam from the first intermediate image passes through a third converging group to form a second intermediate image of the pattern in an aperture of a second plane mirror. A beam from the second intermediate image is reflected by a fourth converging group including a second concave reflecting mirror, thereafter is reflected at the periphery around the aperture of second plane mirror, and then passes through a fifth converging group to form an image of the second intermediate image on a second surface. A projection optical system is arranged as described without using a beam splitter. The projection optical system is composed of a reflecting optical system and a refracting optical system and has little eclipse of beam and a large numerical aperture. Use of such a projection optical system permits a catadioptric projection exposure apparatus excellent in imaging performance to be provided.
A projection exposure apparatus comprising a projection optical system having a first partial imaging optical system for forming a first intermediate image of a pattern existing on a first surface and a second partial imaging optical system for re-imaging said first intermediate image to form an image thereof on a second surface;
A projection exposure apparatus comprising a projection optical system having a first partial imaging optical system for forming an intermediate image of a pattern existing on a first surface and a second partial imaging optical system for re-imaging said intermediate image to form an image thereof on a second surface;
A projection exposure apparatus comprising a projection optical system having a first partial imaging optical system for forming a first intermediate image of a pattern existing on a first surface and a second partial imaging optical system for re-imaging said first intermediate image to form an image thereof on a second surface;
A projection exposure apparatus comprising a projection optical system having a first partial imaging optical system for forming an intermediate image of a pattern existing on a first surface and a second partial imaging optical system for re-imaging said intermediate image to form an image thereof on a second surface;
Dependencies are inferred from the claim text.