Process for the production of a microtip electron source and microtip electron source obtained by this process
AssigneeCommissariat a l'Energie Atomique
InventorsRobert Meyer, Pierre Vaudaine, Philippe Rambaud
Life of this patent
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Abstract
A process for the production of microtip electron sources and the products produced thereby. The process includes a first cleaning stage with a first wet chemical cleaning substage and/or a second plasma cleaning substage and a finishing stage using surface etching. A second cleaning stage using a wet chemical cleaning can also be used. The process uses a system of cathode conductors, grids superimposed an intermediate insulator and microtips deposited on the cathode conductors.
Claims20
Process for the production of an electron source comprising a system of cathode conductors, grids superimposed with an intermediate insulator and microtips, the grids being geometrically located between a lower plane and an upper plane, the microtips undergoing:
- a first cleaning stage comprising a first, wet chemical cleaning substage and/or a second plasma cleaning substage,
- a finishing stage by surface etching.
Process according to any one of the 1,2 and 4-6 the surface etching of the microtips being performed over a thickness of a few dozen to a few thousand Angstroms.
Process according to any one of the 1,2 and 4-6 characterized in that, prior to the cleaning and finishing stages, the microtips are respectively produced in at least two parts:
- a first part serving as a base and made from a first conductor material chosen in such a way that it is not or is only very slightly etched by the finishing stage,
- a second part constituting the actual tip and deposited on the first part, said second part being made from a second conductor material chosen in such a way that it is etched by the finishing stage.
Microtip electron source comprising a system of cathode conductors, grids superimposed with an intermediate insulator and microtips deposited in holes made in the grids and the insulator, the grids being geometrically located between a lower plane and an upper plane, the microtips respectively comprising at least two parts:
- a first, truncated cone-shaped part of height and made from a first conductor material,
- a second part, constituting a conical tip and deposited on the first part, being made from a second conductor material,
- the first and second materials being chosen in such a way that the second material can be finished by selective etching with respect to the first material.
Dependencies are inferred from the claim text.