US 5,635,332 AGranted

Alkylsulfonium salts and photoresist compositions containing the same

AssigneeNEC Corporation

InventorsKaichiro Nakano, Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa

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Abstract

A photoresist composition containing an alkylsulfonium salt compound represented by the following general formula (I): ##STR1## wherein R.sup.1 and R.sup.2 may be the same or different, each being a linear, branched or cyclic C.sub.1 to C.sub.8 alkyl radical, R.sup.3 is a linear, branched or cyclic C.sub.1 to C.sub.8 alkyl radical, a C.sub.5 to C.sub.7 2-oxocycloalkyl radical, or a linear or branched C.sub.3 to C.sub.8 2-oxoalkyl radical, and Y.sup.- represents a counter ion. The photoresist composition has high transparency to deep U.V. light having wavelengths of 220 nm or less and is capable of forming good fine patterns with high sensitivity, thus being useful as chemically amplified type resist which is exposed to the deep U.V. light from an ArF excimer laser.

Claims4

Dependent claims

A photoresist composition comprising

(a) an alkylsulfonium salt compound represented by the following general formula (I):
##STR20## wherein R.sup.1 and R.sup.2 each are a radical selected from the group consisting of methyl, ethyl, n-propyl, i-propyl, n-butyl, i-butyl, sec-butyl, tert-butyl, pentyl, hexyl, heptyl, octyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclopropylmethyl, 4-methylcyclohexyl, and cyclohexylmethyl radicals, R.sup.1 and R.sup.2 may be the same or different;
R.sup.3 is a radical selected from the group consisting of 2-oxocyclopentyl, 2-oxocyclohexyl, and 2-oxocycloheptyl radicals;
and Y.sup.- is a counter ion selected from the group consisting of CF.sub.3 SO.sub.3.sup.-, ClO.sub.4.sup.-, and CH.sub.3 SO.sub.3.sup.- ;
and
(b) a polymer wherein said polymer has transparency under ultraviolet radiation of 220 nm or less and has a functional group or a radical which is unstable to acid.

3 more elements

Dependencies are inferred from the claim text.

Facts

Application: 08/274,436Filed 13 Jul 1994
Priority: JP 5-17452814 Jul 1993
Granted: 3 Jun 1997
Term ends: Not estimatedThe source records don’t support an estimate.

Classification10 codes

G03F 7/0045
Photosensitive materials: with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
C07C 381/12
Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00: sulfonium compounds
C07C 2601/08
With a five-membered ring: the ring being saturated
C07C 2601/14
With a six-membered ring: the ring being saturated