Layout methodology, mask set, and patterning method for phase-shifting lithography
AssigneeIntel Corporation
InventorGiang T. Dao
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Abstract
A device layer layout methodology, and method and apparatus for patterning a photosensitive layer. Device features are placed on lines running in rows and/or columns during layout. The lines and/or columns are extracted from the database to produce a layout of the phase-edge phase shifting layer. The photosensitive layer may be exposed to a mask corresponding to this layout, to produce latent image of the rows and/or lines. The photosensitive layer is also exposed to the device layer layout to expose unwanted portions of the phase-edge layer. Methods of forming a variety of device features, including contact/via openings and contact/via plugs are disclosed.
Claims11
A method of patterning a photosensitive layer comprising the steps of:
- providing said photosensitive layer on a substrate;
- exposing said photosensitive layer to a first mask having a pattern of first regions and second regions, said first regions and said second regions transmitting at least a portion of radiation incident thereon, said first regions phase-shifting radiation transmitted therethrough with respect to radiation transmitted through said second regions, said pattern arranged to produce a plurality of substantially unexposed lines in said photosensitive layer;
- exposing said photosensitive layer to a second mask comprising a plurality of device features, each of said plurality of device features overlying at least a portion of one of said lines;
- wherein said first mask and said second mask are produced from a device layer layout produced by a method comprising the steps of:
- defining said plurality of lines;
- defining said plurality of device features, wherein said features on said second mask comprise segments extending in a first and a second direction;
- and,
- placing each of said plurality of device features in a known relationship with respect to one of said lines.
Dependencies are inferred from the claim text.