Substrate having coating resistant to environmental etch, coating composition therefor, process for making the coating composition, and process of coating a substrate with the composition
AssigneeBASF SE
InventorsAnna M. Budde, James A. Laugal, Walter H. Ohrbom, Marvin L. Green, Mark R. Montagne
Life of this patent
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Abstract
A sterically-hindered monomer is used to make a polymer which in turn is useful in coating compositions. The resulting residue of the sterically-hindered monomer is present in the polymer, as well as in a cured coating (preferably an automotive coating) produced using a coating composition having the polymer therein. The presence of the residue of the sterically-hindered monomer imparts in the cured coating a resistance to environmental etching.
Claims11
A coated article comprising a substrate having a cured coating thereon, wherein the cured coating comprises a polymer having a theoretical T.sub.g of from about 10.degree. C. to about 70.degree. C., wherein about 75 weight percent to about 100 weight percent of the polymer consists of residues of a sterically-hindered monomer and an ethylenically unsaturated comonomer having a functional site for crosslinking during curing in amounts sufficient to produce a coating exhibiting enhanced environmental etch resistance;
- and further wherein any sterically-hindered vinyl monomer residue is present in an amount of from 0 to about 67 weight percent, based on a total of the weight of the sterically hindered monomer residue and the ethylenically unsaturated comonomer residue.
Dependencies are inferred from the claim text.