Method and system for controlling the relative size of images formed in light-sensitive media

Structures on a substrate formed with an imaging system having a resolution limit, comprising;

• a first structure on a first substrate region having a first masking pattern comprising a first substrate image having a first substrate image size, said first substrate image size at or near the resolution limit of the imaging system;
• a second structure on a second substrate region having a second masking pattern comprising a second substrate image having a second substrate image size, said second substrate image size at or near the resolution limit of the imaging system, wherein said second masking pattern has an optical transmission substantially different from said first masking pattern;
• said first and second structures defined by the same single mask having first and second mask images corresponding to said first and said second substrate images, said mask images not predistorted to correct for masking pattern dependent linewidth bias;
• and
• wherein said first and said second substrate images are substantially undistorted by masking pattern dependent linewidth bias.