US 5,634,978 A · Ultra-low particle semiconductor method

Abstract

A method operates a system for wet processing of semiconductors. The system includes an inlet coupled to a fluid source, and a filter coupled to the inlet. The system also includes a sealed vessel coupled to the filter where the sealed vessel has a lower liquid portion and an upper vapor portion. The system further includes an outlet coupled to the sealed vessel. The outlet is attached to the lower liquid portion. A solvent injector coupled to the sealed vessel is also used. The solvent injector is coupled to the upper vapor portion, and supplies a gaseous mixture including a polar organic compound. The polar organic compound is a non-saturated polar organic vapor. The system also includes a gas source coupled to the sealed vessel. The gas source is coupled to the upper vapor portion, and supplies an inert gas into the upper vapor portion. A device for removing the liquid from the lower liquid portion at substantially a constant liquid level rate is also included.

Claims28

Dependent claims

A method of removing a liquid from a plurality of semiconductor wafers disposed within wafer supports in a wafer carrier, the method comprising the steps of:

immersing said wafer carrier with said semiconductor wafers disposed therein in a liquid comprising water, said wafers being disposed below a liquid level;
supporting said semiconductor wafers in said wafer carrier at an acute angle from vertical so as to prevent said semiconductor wafers from touching each other;
causing said liquid level to drop from a first position above said semiconductor wafers to a second position below said semiconductor wafers;
and
maintaining said semiconductor wafers substantially stationary and at said acute angle from vertical while said liquid level is dropping from said first position to said second position, whereupon said wafers continue to be prevented from touching each other so that said liquid does not get trapped between adjacent wafers.

2 more elements

Dependencies are inferred from the claim text.

Ultra-low particle semiconductor method

Life of this patent

Ultra-low particle semiconductor method

Life of this patent

Abstract

Claims28