Data processor and method of processing data in parallel

A data processor for converting mask data for a semiconductor integrated circuit into exposure data, comprising:

• a plurality of data processing units connected to a data bus, each of said plurality of data processing units including:
• (a) a first storage device, having a data storage allowable value, to temporarily store mask data assigned to each of said plurality of data processing units, and
• (b) a first controller which sets up a data excess flag if said mask data has an amount in excess of said data storage allowable value of said first storage device and are assigned to said data processing unit when said first controller converts said mask data into exposure data;
• a second storage device connected to said data bus, to store said mask data which are to be transferred to said respective first storage devices in said plurality of data processing units;
• and
• a second controller connected to said data bus, to adjust a computation share among said plurality of data processing units while monitoring said data excess flag, said second controller including:
• (a) first means for splitting a layout region of said semiconductor integrated circuit into a plurality of fields,
• (b) means for assigning said mask data belonging to said plurality of fields to respective data processing units,
• (c) means for detecting said data excess flag set up in said data processing unit to which said mask data are assigned,
• (d) second means for further splitting only a field including said mask data assigned to said data processing unit in which said data excess flag is set up into smaller fields if said data excess flag is detected, and
• (e) means for transferring said mask data included in said smaller fields respectively from said second storage device to said first storage devices of said data processing units in which said data excess flag is not set up.

A data processor for generating graphic data to form a reticle based on design data for a semiconductor integrated circuit, comprising:

• a plurality of graphic processing modules connected to a data bus, each of said plurality of graphic processing modules including:
• (a) a field memory, having a data storage allowable value, to temporarily store design data assigned to each graphic processing module, and
• (b) a sub-processing control device which sets up a data excess flag if said design data has an amount in excess of said data storage allowable value of said field memory and are assigned to said graphic processing module when said sub-processing control generates graphic data by computing said design data;
• a main memory connected to said data bus, to store said design data which are to be transferred to respective field memories in said plurality of graphic processing modules;
• and
• a main processing control device connected to said data bus, to adjust a computation share among said plurality of graphic processing modules, said main processing control device including:
• (a) first means for splitting a layout region of said semiconductor integrated circuit into a plurality of fields,
• (b) means for assigning said design data belonging to said plurality of fields to respective graphic processing modules,
• (c) means for detecting said data excess flag set up in said graphic processing modules to which said mask data are assigned,
• (d) second means for further splitting only a field including said design data assigned to said graphic processing modules in which said data excess flag is set up into smaller fields if said data excess flag is detected, and
• (e) means for transferring said design data included in said smaller fields respectively from said main memory to said field memories of said graphic processing modules in which said data excess flag is not set up.

A data processor for converting mask data for a semiconductor integrated circuit into exposure data for mask exposure, comprising:

• a plurality of graphic processing modules connected to a data bus, each of said plurality of graphic processing modules including:
• (a) a field memory, having a data storage allowable value, to temporarily store said mask data assigned to each graphic processing module, and
• (b) a sub-processing control device which sets up a data excess flag if said mask data has an amount in excess of said data storage allowable value of said field memory and are assigned to said graphic processing module when said sub-processing control device converts said mask data into exposure data;
• a main memory connected to said data bus, to store said mask data which are to be transferred to respective field memories in said plurality of graphic processing modules;
• and
• a main processing control device connected to said data bus, to adjust a computation share among said plurality of graphic processing modules, said main processing control device including:
• (a) first means for splitting a layout region of said semiconductor integrated circuit into a plurality of fields,
• (b) means for assigning said mask data belonging to said plurality of fields to respective graphic processing modules,
• (c) means for detecting said data excess flag set up in said graphic processing modules to which said mask data are assigned,
• (d) second means for further splitting only a field including said mask data assigned to said graphic processing modules in which said data excess flag is set up into smaller fields if said data excess flag is detected, and
• (e) means for transferring said mask data included in said smaller fields respectively from said main memory to said field memories of said graphic processing modules in which said data excess flag is not set up.

A method of generating graphic data by computing design data for a semiconductor integrated circuit in parallel, for use in a data processor including a plurality of data processing units connected to a data bus, each of said plurality of data processing units having a data storage allowable value and generating said graphic data by computing said design data assigned to each data processing unit, and a controller connected to said data bus, for adjusting a computation share among said plurality of data processing units, said method comprising the steps of:

• splitting a layout region of said semiconductor integrated circuit into a plurality of fields;
• comparing an amount of design data included in said plurality of fields with a data storage allowable value of said data processing units, respectively;
• detecting a data excess flag set up in said data processing unit to which said design data are assigned;
• further splitting only a field including said design data into smaller fields if said amount of design data exceeds said data storage allowable value;
• and
• transferring said design data included in said smaller fields to said data processing unit in which said data excess flag is not set up.

A method of converting mask data for a semiconductor integrated circuit into exposure data in parallel, for use in a data processor including a plurality of data processing units connected to a data bus, each of said plurality of data processing units having a data storage allowable value and converting said mask data assigned to each data processing unit into said exposure data, and a controller connected to said data bus, for adjusting a computation share among said plurality of data processing units, said method comprising the steps of:

• splitting a layout region of said semiconductor integrated circuit into a plurality of fields;
• comparing an amount of mask data included in said plurality of fields with a data storage allowable value of said data processing units, respectively;
• detecting data excess flag set up in said data processing unit to which said mask data are assigned;
• further splitting only a field including said mask data into smaller fields if said amount of mask data exceeds said data storage allowable value;
• and
• transferring said mask data included in said smaller fields to said data processing unit in which said data excess flag is not set up.

A method of generating graphic data by computing design data for a semiconductor integrated circuit, for use in a data processor including a plurality of data processing units connected to a data bus, each of said plurality of data processing units having a data storage allowable value and setting up a data excess flag if said design data having an amount in excess of said data storage allowable value of said first storage device are assigned to said data processing unit when said graphic data is generated by computing said design data assigned to said data processing unit, and a controller connected to said data bus, for adjusting a computation share among said plurality of data processing units while monitoring said data excess flag, said method comprising the steps of:

• splitting a layout region of said semiconductor integrated circuit into a plurality of fields;
• assigning said design data belonging to said plurality of fields to respective data processing units;
• detecting said data excess flag set up in said data processing unit to which said design data are assigned;
• further splitting only a field including said design data assigned to said data processing unit in which said data excess flag is set up into smaller fields if said data excess flag is detected;
• and
• transferring said design data included in said smaller fields respectively to said data processing units in which said data excess flag is not set up.

A method of converting mask data for a semiconductor integrated circuit into exposure data for mask exposure, for use in a data processor including a plurality of data processing units connected to a data bus, each of said plurality of data processing units having a data storage allowable value and for setting up a data excess flag if said mask data having an amount in excess of said data storage allowable value of said data processing unit are assigned to said data processing unit when said mask data assigned to said data processing unit is converted into said exposure data, and a controller connected to said data bus, for adjusting a computation share among said plurality of data processing units while monitoring said data excess flag, said method comprising the steps of:

• splitting a layout region of said semiconductor integrated circuit into a plurality of fields;
• assigning said mask data belonging to said plurality of fields to respective data processing units;
• detecting said data excess flag set up in said data processing unit to which said mask data are assigned;
• further splitting only a field including said mask data assigned to said data processing unit in which said data excess flag is set up into smaller fields if said data excess flag is detected;
• and
• transferring said mask data included in said smaller fields respectively to said data processing units in which said data excess flag is not set up.

A method of generating graphic data to form a reticle by computing design data for a semiconductor integrated circuit, for use in a data processor including a plurality of graphic processing modules connected to a data bus, each of said plurality of graphic processing modules having a data storage allowable value and for setting up a data excess flag if said design data having an amount in excess of said data storage allowable value of said graphic processing module are assigned to said graphic processing module when said graphic data is generated by computing said design data assigned to said graphic processing module, and a processing control device connected to said data bus, for adjusting a computation share among said plurality of graphic processing modules while monitoring said data excess flag, said method comprising the steps of:

• splitting a layout region of said semiconductor integrated circuit into a plurality of fields;
• assigning said design data belonging to said plurality of fields to respective graphic processing modules;
• detecting said data excess flag set up in said graphic processing modules to which said design data are assigned;
• further splitting only a field including said design data assigned to said graphic processing modules in which said data excess flag is set up into smaller fields if said data excess flag is detected;
• and
• transferring said design data included in said smaller fields respectively to said graphic processing modules in which said data excess flag is not set up.

A method of converting mask data for a semiconductor integrated circuit into exposure data for mask exposure, for use in a data processor including a plurality of graphic processing modules connected to a data bus, each of said plurality of graphic processing modules having a data storage allowable value and setting up a data excess flag if said mask data having an amount in excess of said data storage allowable value of said graphic processing modules are assigned to said graphic processing modules when said mask data assigned to said graphic processing modules is converted into said exposure data, and a processing control device connected to said data bus, for adjusting computation share among said plurality of graphic processing modules while monitoring said data excess flag, said method comprising the steps of:

• splitting a layout region of said semiconductor integrated circuit into a plurality of fields;
• assigning said mask data belonging to said plurality of fields to respective graphic processing modules;
• detecting said data excess flag set up in said graphic processing modules to which said mask data are assigned;
• further splitting only a field including said mask data assigned to said graphic processing module in which said data excess flag is set up into smaller fields if said data excess flag is detected;
• and
• transferring said mask data included in said smaller fields respectively to said graphic processing modules in which said data excess flag is not set up.