Stage movement control apparatus and method therefor and projection exposure apparatus and method therefor
AssigneeNikon Corporation
InventorMasato Takahashi
Life of this patent
Estimating the term…
Abstract
When a stage moves, the position of the stage is detected by an interferometer, and a control unit controls the position of the stage while monitoring the output of the interferometer. Thus, the control unit effects positioning of the stage. In addition, the control unit calculates the square root of an arithmetic mean of the square of an error between target and present positions of the stage on the basis of the output of the interferometer, and estimates an amount of vibration of the stage on the basis of the result of the calculation, thereby enabling vibration characteristics to be quantitatively evaluated to a certain extent when the damping of vibration is rapid immediately after positioning, or when the damping is gentle or almost zero.
Claims6
A stage movement control apparatus for controlling a position of a stage which is movable along a straight line or in two orthogonal axis directions, said apparatus comprising:
- a position sensor for detecting a position of said stage;
- a controller for controlling the position of said stage while monitoring an output of said position sensor;
- and
- an arithmetic system for calculating a square root of an arithmetic mean of a square of an error between a target position of said stage and a present position of said stage on the basis of the output of said position sensor during positioning of said stage.
A projection exposure apparatus for projecting and transferring a mask pattern onto an exposure region on a photosensitive substrate placed on a stage movable in two orthogonal axis directions, while successively moving a position of said stage, said apparatus comprising:
- said stage;
- a position sensor for detecting a position of said stage;
- a controller for controlling the position of said stage while monitoring an output of said position sensor;
- a projection optical system for projecting a pattern formed in a transfer region on a mask onto an exposure region on a photosensitive substrate placed on said stage;
- an illumination system for applying illuminating light for exposure to the transfer region on said mask;
- an arithmetic system for calculating a square root of an arithmetic mean of a square of an error between a target position of said stage and a present position of said stage on the basis of the output of said position sensor during positioning of said stage;
- and
- an adjusting system for adjusting control characteristics of said controller on the basis of a result of said calculation.
A stage movement control method for controlling a position of a stage which is movable in a one- or two-dimensional direction, said method comprising the steps of:
- detecting a position of said stage;
- calculating a square root of an arithmetic mean of a square of an error between a target position of said stage and a present position of said stage during positioning of said stage;
- and
- judging whether or not an amount of vibration of said stage is within a predetermined tolerance on the basis of a result of said calculation.
A projection exposure method for projecting an image of a pattern formed on a mask onto a substrate on a stage movable in a two-dimensional direction, said method comprising the steps of:
- detecting a position of said stage;
- calculating a square root of an arithmetic mean of a square of an error between a target position of said stage and a present position of said stage during positioning of said stage;
- judging whether or not an amount of vibration of said stage is within a predetermined tolerance on the basis of a result of said calculation;
- and
- adjusting control characteristics of said stage on the basis of a result of said judgment.
Dependencies are inferred from the claim text.