Method of detecting particles of semiconductor wafers
AssigneeThe Board of Trustees of the Leland Stanford Jr. University
InventorCalvin F. Quate
Life of this patent
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Abstract
A device for detecting the presence of particles and irregularities on the surface of a semiconductor wafer or other substrate includes a plurality of cantilevers formed on a semiconductor substrate and a means of detecting the deflection of each of the cantilevers. The cantilevers may, for example, be formed in rows and separated by selected distances. The entire substrate is then scanned over the surface to be examined, in a raster pattern, for example, and the deflection of the individual cantilevers is monitored.
Claims12
A method of testing a semiconductor wafer or other flat body for the presence of loose particles, said method including the steps of:
- (a) providing a substrate, said substrate including a plurality of cantilevers arranged in a selected pattern, each of said cantilevers having a tip located near a free end;
- (b) providing a semiconductor wafer or other flat body;
- (c) bringing said substrate and said wafer or other flat body into a juxtaposed relationship such that the tips of the cantilevers are near or in contact with a surface of the wafer or other flat body;
- (d) causing relative motion between said substrate and said wafer or other flat body, said relative motion being in two dimensions and in a plane parallel to the surface of the wafer or other flat body such that individual tips of said cantilevers scan the surface of said wafer or other flat body in two dimensions;
- (e) detecting the deflection of individual ones of said cantilevers;
- and
- (f) using the deflection of individual ones of said cantilevers to identify the presence of loose particles on the surface of said wafer or other flat body.
Dependencies are inferred from the claim text.