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US 5,633,195 AGranted
Laser planarization of zone 1 deposited metal films for submicron metal interconnects
AssigneeInternational Business Machines Corporation
InventorsWilliam L. Guthrie, Naftali E. Lustig
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Abstract
A method of laser planarizing metallic thin films minimizes the laser fluences required to melt or nearly melt the metalization. This is accomplished by reducing the optical reflectivity of the metallic lines and vias by using textured thin films. This reduction of optical reflectivity, in turn, reduces the minimum fluence needed to melt or nearly melt the metal using a laser, thus improving the process window and minimizing the damage to the surrounding media.
Claims9
A method of laser planarizing metallic films consisting essentially of the steps of:
- forming a metallic film under zone 1 deposition conditions by depositing a metallic film on a substrate at a working gas pressure sufficiently high to produce a metallic film having a columnar morphology and a textured surface on the film, the textured film having a lower optical reflectivity and higher absorption of laser radiation of a range of wavelengths than said metallic film as formed with a smooth surface under other than zone 1 deposition conditions;
- and
- heating the textured film by means of laser radiation of said range of wavelengths to melt the film, whereby a lower minimum fluence of the laser radiation is required to melt or nearly melt the film than required for said smooth metallic film.
Dependencies are inferred from the claim text.