US 5,633,123 A · System for ablative imaging by proximity lithography

Abstract

A system for prolonging the useful life of a mask while ablating a pattern into a workpiece. The system includes a workpiece, a debris-blocking layer thereon, a laser directed toward the workpiece, and a mask provided between the laser and debris-blocking layer. The workpiece may be a data storage disk comprising a substrate and a magnetic coating thereon. The laser may be an ultraviolet laser and the debris-blocking layer should be transparent to the light emitted by the laser. The pattern may include concentric or spiral optical servo tracks in the magnetic coating. The debris-blocking layer minimizes degradation of the mask, thereby minimizing the need to clean the mask and prolonging the useful life of the mask.

Claims16

Dependent claims

A system for prolonging the useful life of a mask while ablating a pattern into a workpiece, comprising:

a workpiece;
a debris-blocking layer, in contact with the workpiece, which is substantially transparent to ultraviolet radiation;
a mask in contact with a side of the debris-blocking layer opposite the workpiece;
means for positioning the debris-blocking layer in contact with the workpiece and for positioning the mask in contact with the debris-blocking layer;
means for separating the debris-blocking layer and mask from the workpiece;
and
a high energy source of ultraviolet radiation capable of ablating the workpiece;
whereby a pattern corresponding to the mask may be ablated into the workpiece by the high energy source while the debris-blocking layer minimizes degradation of the mask, thereby minimizing the need to clean the mask and prolonging the useful life of the mask.

5 more elements

Dependencies are inferred from the claim text.

System for ablative imaging by proximity lithography

Life of this patent

System for ablative imaging by proximity lithography

Life of this patent

Abstract

Claims16