Mask and projection exposure method
AssigneeNikon Corporation
InventorYuji Imai
Life of this patent
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Abstract
An exposure mask formed with a predetermined pattern for exposure on a substrate to be subjected to exposure comprises a glass substrate and a heat conductive film having a thermal conductivity higher than that of the glass substrate, wherein the heat conductive film is so formed as to cover substantially an entire surface of the glass substrate, and the pattern is so formed as to be in contact with the heat conductive film.
Claims11
In a projection exposure apparatus having an illumination optical system for illuminating a mask, formed with a pattern, with illuminating light of a predetermined wavelength region, and a projection optical system for forming an image of the pattern onto a substrate to be subjected to exposure, the improvement wherein:
- said mask comprises a glass substrate, and a heat conductive film transmissive to the illuminating light and having a thermal conductivity higher than that of said glass substrate;
- said heat conductive film is so formed as to cover substantially an entire surface of said glass substrate, and said pattern is so formed as to cover a portion of said surface and to be in contact with said heat conductive film, said heat conductive film producing an isotropic temperature distribution within said mask such that thermal deformation of said mask due to absorption of said illuminating light becomes isotropic;
- and
- a correction system is provided that corrects for variation of an imaging characteristic of said projection optical system due to said thermal deformation of said mask.
A projection exposure method for illuminating a mask with illuminating light of a predetermined wavelength region, thereby forming an image of a pattern, formed on said mask, through a projection optical system onto a substrate to be subjected to exposure, wherein:
- said mask comprises a glass substrate, and a heat conductive film transmissive to the illuminating light and having a thermal conductivity higher than that of said glass substrate, wherein said heat conductive film is so formed as to cover substantially an entire surface of said glass substrate and said pattern is so formed as to cover a portion of said surface and to be in contact with said heat conductive film, said heat conductive film producing an isotropic temperature distribution within said mask such that thermal deformation of said mask due to absorption of said illuminating light becomes isotropic;
- and
- correction is effected for variation of an imaging characteristic of said projection optical system generated due to said thermal deformation of said mask.
Dependencies are inferred from the claim text.