Hydrochlorination process for converting high-boiling residue from direct process to monosilanes
AssigneeDow Corning Corporation
InventorsSteven K. Freeburne, Robert F. Jarvis, Jr.
Life of this patent
Estimating the term…
Abstract
A hydrochlorination process for the production of monosilanes from the high-boiling residue resulting from the reaction of organochlorides with silicon metalloid in a process typically referred to as the "direct process." The process comprises (A) forming a mixture comprising the high-boiling residue and an organosilane and (B) contacting the mixture with hydrogen chloride in the presence of a catalytic amount of a catalyst composition effective in promoting the formation of monosilanes from the high-boiling residue. A preferred catalyst composition comprises aluminum trichloride, at least a portion of which may be formed in situ during conduct of the direct process and isolation of the high-boiling residue.
Claims19
A process for converting a high-boiling residue resulting from the reaction of an organochloride with silicon metalloid to monosilanes, the process comprising:
- (A) forming a mixture comprising a high-boiling residue resulting from the reaction of an organochloride with silicon metalloid and an organosilane described by formula
- R.sub.m H.sub.n SiCl.sub.4-m-n,
- where each R is independently selected from a group consisting of alkyls comprising one to six carbon atoms, aryls, alkoxys comprising one to six carbon atoms, trimethylsilyl, and trifluoropropyl, m=1 to 4, n=0 to 2, and m+n=2 to 4;
- and
- (B) contacting the mixture with hydrogen chloride in the presence of a catalytic amount of a catalyst composition effective in promoting the formation of monosilanes from the high-boiling residue at a temperature within a range of about 150.degree. C. to 500.degree. C. and a total reactor pressure within a range of about 100 psig to 5,000 psig.
A one-step process for converting a high-boiling residue resulting from the reaction of an organochloride with silicon metalloid to monosilanes, the process comprising:
- (A) forming a mixture comprising a high-boiling residue resulting from the reaction of methyl chloride with silicon metalloid and trimethylchlorosilane, and
- (B) contacting the mixture with hydrogen chloride in the presence of about 0.5 to 5 weight percent aluminum chloride, based on the combined weight of the aluminum chloride and the high-boiling residue, at a temperature within a range of about 300.degree. C. to 375.degree. C. and a total reactor pressure within a range of about 600 psig to 1,100 psig and thereby forming monosilanes.
Dependencies are inferred from the claim text.