Method and apparatus for wavevector selective pyrometry in rapid thermal processing systems
AssigneeAST Elekronik
InventorsZsolt Nenyei, Andreas Tillmann, Heinrich Walk
Life of this patent
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Abstract
A method and apparatus for optical pyrometry in a Rapid Thermal Processing (RTP) System, whereby the radiation used to heat the object to be processed in the RTP system is in part specularly reflected from specularly reflecting surfaces and is incident on the object with a particular angular distribution, and the thermal radiation from the object is measured at an angles different from the angle where the incident radiation specularly reflected from the surface of the object is a maximum.
Claims21
A method for optical temperature measurement of an object to be processed in a rapid thermal processing system comprising:
- a. irradiating a specularly reflecting area of a surface of the object with incident radiation having a particular angular distribution, the incident radiation arising in part from one or more reflections of radiation from at least one radiation source, the reflections of radiation being substantially specular;
- and b. measuring radiation emitted and reflected from the specularly reflecting area of the surface of the object at angles different from an angle where the incident radiation reflected from the specularly reflecting area of the surface of the object has maximum intensity.
A rapid thermal processing apparatus for processing an object and optical temperature measurement of the object comprising;
- a reflection chamber for multiply specularly reflecting radiation from one or more radiation sources so that the radiation is incident on to a specularly reflecting area of the surface of the object to be processed, the radiation incident on the specularly reflecting area of the surface of the object having a particular angular distribution;
- and means for measuring radiation emitted from the specularly reflecting area of the surface of the object to processed, the means for measuring radiation being sensitive primarily to radiation emitted from the specularly reflecting area of the surface at an angle different from an angle where the radiation incident on the specularly reflecting area of the surface and then reflected from the specularly reflecting area of the surface has maximum intensity.
Dependencies are inferred from the claim text.