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US 5,627,641 AGranted
Isotopic analysis process by optical emission spectrometry on laser-produced plasma
AssigneeCommissariat a l'Energie Atomique
InventorsPatrick Mauchien, Walter Pietsch, Alain Petit, Alain Briand
Life of this patent
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Abstract
Isotopic analysis process by optical emission spectrometry on laser-produced plasma. According to the invention, the sample to be analyzed (10) is irradiated by a laser beam (20) to produce a plasma (13), the light spectrum emitted by said plasma is analyzed and from it is deduced the isotopic composition of the sample. Application to isotopic analysis in the nuclear industry.
Claims3
A process for isotropic analysis of a sample comprising the steps of:
- irradiating said sample to be analyzed by a pulse-type laser beam to produce a plasma on its surface, said plasma emitting a spectrum of light, and said each pulse of said laser beam having an energy equal to or below ten milliJoules per cm.sup.2 ;
- analyzing said spectrum of the light at a time lag of at least equal to 200 ns relative to said laser pulse, wherein isotropic information is obtainable to allow said isotropic analysis.
Dependencies are inferred from the claim text.