Method for coating metal disc substrates for magnetic-recording media
AssigneeTulip Memory Systems, Inc.
InventorsRichard D. Weir, Carl W. Nelson
Life of this patent
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Abstract
A coated metal-substrate disk for magnetic-recording applications is disclosed having a first coating selected from the group consisting of nitrides, carbides, or borides of titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, or tungsten, or the group consisting of aluminum nitride, silicon nitride, or silicon carbide on the metal substrate and a magnetic-recording material coating on the first coating. The first coatings are applied by evaporative reactive ion plating or by reactive sputtering.
Claims21
A method for fabricating a magnetic recording medium comprising the steps of:
- providing a metal substrate composed of an aluminum alloy;
- depositing titanium onto a surface of the substrate to create a graded interfacial diffusion of the titanium into the substrate, and then;
- depositing a layer of titanium-nitrogen binary compositions to create a graded interfacial diffusion of the titanium-nitrogen binary compositions into the titanium, wherein the layer of titanium-nitrogen binary compositions has a thickness of between 1.0 micrometer and 6.0 micrometers, and then;
- depositing a layer of ferromagnetic material.
A method for fabricating a magnetic recording medium comprising the steps of:
- providing a metal substrate composed of an aluminum alloy;
- depositing a first layer on the substrate, wherein the first layer is composed of an element selected from the group consisting of aluminum, silicon, titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, and tungsten, and wherein depositing the first layer creates a graded interfacial diffusion of said element into the substrate, and then;
- depositing a second layer on the first layer, wherein the second layer is selected from the group consisting of aluminum nitride, silicon nitride, silicon carbide, and nitrides, carbides, and borides of titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, or tungsten, and the second layer includes the element of the first layer, and wherein depositing the second layer creates a graded interfacial diffusion of the second layer into the first layer, wherein the second layer has a thickness of between 1.0 micrometer and 6.0 micrometers, and then;
- depositing a layer of ferromagnetic material.
A method for fabricating a magnetic recording medium comprising the steps of:
- providing a metal substrate;
- depositing titanium onto a surface of the substrate to create a graded interfacial diffusion of the titanium into the substrate, and then;
- depositing a layer of titanium-nitrogen binary compositions to create a graded interfacial diffusion of the titanium-nitrogen binary compositions into the titanium, wherein the layer of titanium-nitrogen binary compositions is characteristic of an energetic-atom-deposited dense fibrous Zone T structure on a Movchan-Demchishin-Thornton zone-structure diagram and wherein said layer is deposited by evaporative reactive ion plating or by reactive sputtering, and then;
- depositing a layer of ferromagnetic material.
A method for fabricating a magnetic recording medium comprising the steps of:
- providing a metal substrate;
- depositing a first layer on the substrate, wherein the first layer is composed of an element selected from the group consisting of aluminum, silicon, titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, and tungsten, and wherein depositing the first layer creates a graded interfacial diffusion of said element into the substrate, and then;
- depositing a second layer on the first layer, wherein the second layer is selected from the group consisting of aluminum nitride, silicon nitride, silicon carbide, and nitrides, carbides, and borides of titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, or tungsten, and the second layer includes the element of the first layer, and wherein depositing the second layer creates a graded interfacial diffusion of the second layer into the first layer, wherein the second layer is characteristic of an energetic-atom-deposited dense fibrous Zone T structure on a Movchan-Demchishin-Thornton zone-structure diagram and wherein said second layer is deposited by evaporative reactive ion plating or by reactive sputtering, and then;
- depositing a layer of ferromagnetic material.
Dependencies are inferred from the claim text.