Resist processing apparatus, substrate processing apparatus and method of transferring a processed article

A resist processing apparatus comprising:

• a plurality of processing units for resist processing articles to be processed, each of said articles having a peripheral edge portion, an undersurface and an uppersurface portion;
• a transferring unit in communication with said processing units for transferring said articles to said processing units, said transferring unit having arm means comprising supporting means for supporting said peripheral edge portion of each of said articles at a plurality of pawls of said transferring unit and holding means provided with sucking means to contact said undersurface portion of each of said articles for holding each of said articles;
• and
• control means connected to said transferring unit for selecting either of said supporting means and said holding means according to a condition of each of said articles and for automatically controlling an operating range of said arm means so as to hold and transfer each of said articles.

A resist processing apparatus comprising:

• a plurality of processing units for resist processing articles to be processed, each of said articles having a peripheral edge portion, an undersurface and an uppersurface portion;
• a transferring unit in communication with said processing units for transferring said articles to said processing units, said transferring unit having arm means comprising supporting means for supporting said peripheral edge portion of each of said articles at a plurality of pawls of said transferring unit and holding means provided with sucking means to contact said undersurface portion of each of said articles for holding each of said articles;
• and
• selecting means connected to said transferring unit for selecting said holding means when each of said articles which has been applied with a coating liquid and from a peripheral side wall portion of which said coating liquid has not yet been removed is transferred to at least a heating unit which is one of said processing units.

A substrate processing apparatus comprising:

• a plurality of processing units for performing predetermined processes on substrates;
• and
• a transferring unit in communication with said processing units for transferring said substrates to said processing units;
• said transferring unit having arm means comprising supporting means for supporting said peripheral edge portion of each of said substrates at a plurality of pawls of said supporting means and holding means provided with sucking means to contact an undersurface portion of each of said substrates for holding each of said substrates, detecting means for detecting a thickness of a layer formed on each of said substrates, and selecting means connected to said detecting means for selecting either of said supporting means and said holding means based on a detected result of said thickness of said layer on each of said substrates, which thickness is obtained from the detecting means.

A method of transferring articles from arm means movably mounted on a transferring unit for transferring said articles and comprising supporting means having a plurality of supporting portions for supporting each of said articles and holding means having sucking means for holding each of said articles, said method comprising the steps of:

• selecting either of said supporting means and said holding means;
• transferring each of said articles by said arm means;
• and
• detecting a thickness of each of said articles wherein said supporting means is selected when the detected thickness of each of said articles is one of (a) not more than approximately 0.2 .mu.m, or (b) approximately 1 to 2 .mu.m, and each of said articles is supported and transferred by said supporting means.

A resist processing apparatus for processing a semiconductor wafer comprising:

• a transfer mechanism for transferring the semiconductor wafer;
• a first handling means and a second handling means coupled to the transfer mechanism for holding the semiconductor wafer;
• a detector for detecting a state of residue on the peripheral edge of the semiconductor wafer;
• and
• a controller in communication with said transfer mechanism and said detector for selecting one of the first and the second handling means for holding the semiconductor wafer according to the result of the detection.

A resist processing apparatus comprising:

• a plurality of processing units for resist processing articles to be processed, each of said articles having a peripheral edge portion, an undersurface and uppersurface portion;
• a transferring unit in communication with said processing units for transferring said articles to said processing units, said transferring unit having arm means comprising supporting means for supporting said peripheral edge portion of each of said articles at a plurality of pawls of said transferring unit and holding means provided with sucking means to contact said undersurface portion of each of said articles for holding each of said articles;
• a detector for detecting a surface condition of said articles;
• and
• a controller in communication with said transferring unit and said detector for selecting and controlling either of the pawls or said sucking means for holding said articles in accordance with the detected condition where the transferring unit has both said pawls and said sucking means, wherein said arms means includes a plurality of arms.