Apparatus for cleaning semiconductor wafers
AssigneeMEMC Electronic Materials, Inc.
InventorsHenry F. Erk, Ronald D. Bartram, Eugene R. Hollander, Jing Chai
Life of this patent
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Abstract
A method of cleaning a semiconductor wafer comprises placing liquid in a bath with a gas-liquid-interface defined at the surface of the liquid. A semiconductor wafer is placed in the bath so that it is oriented in a generally upright position with at least part of the wafer being in the liquid and below the gas-liquid-interface. Sonic energy is directed through the liquid. At least one of the position of the semiconductor wafer and the level of liquid in the bath relative to the semiconductor wafer is varied so that the entire surface of the wafer repeatedly passes through the gas-liquid-interface.
Claims18
Apparatus for cleaning a semiconductor wafer comprising:
- a tank adapted to contain a liquid, said liquid having an upper surface;
- and
- means for directing sonic energy through liquid contained in the tank;
- a wafer holder for holding the semiconductor wafer in a position within the tank with a central region of the semiconductor wafer being about level with the surface of liquid contained in the tank;
- and
- a wafer-moving mechanism constructed for engaging the semiconductor wafer in the wafer holder to impart a rotating motion to the semiconductor wafer in the tank and to impart a reciprocating motion to the semiconductor wafer so that the central region of the wafer repeatedly passes through the surface of the liquid.
Apparatus for processing semiconductor wafers comprising:
- a tank for containing a liquid;
- said liquid having an upper surface;
- a wafer holder for holding the semiconductor wafer in the tank with at least a portion of the semiconductor wafer being immersed in the liquid within the tank;
- and
- a wafer-moving mechanism constructed for engaging the semiconductor wafer in the tank to rotate the semiconductor wafer relative to the tank and to reciprocate the semiconductor wafer relative to the tank so that at least a central region of the wafer repeatedly passes through the surface of the liquid.
Dependencies are inferred from the claim text.